SCHEMBL9174009

SCHEMBL9174009

CCOC(OCC)c1ccccc1OC(=O)OC(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.42
▸ L3MBTL1 Q9Y468 4/20 0.36
▸ GLA P06280 1/20 0.36
▸ KDM4E B2RXH2 2/20 0.36
▸ HPGD P15428 1/20 0.36
▸ HSD17B10 Q99714 1/20 0.36
▸ GAA P10253 1/20 0.33
▸ HCRTR1 O43613 1/20 0.33
▸ BRD4 O60885 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ PPARG P37231 1/20 0.33
▸ ITGA4 P13612 1/20 0.33
▸ ITGB7 P26010 1/20 0.33
▸ POLB P06746 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ PTGS2 P35354 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9262177 0.77 NCEH1 (0.44) GAABRD4KMT2AHTTNPSR1
SCHEMBL11459966 0.77 ALDH1A1 (0.53) L3MBTL1GLAKDM4EHSD17B10GAA
SCHEMBL7863120 0.75 ELANE (0.43) ELANEKDM4EHPGDHSD17B10GAA
SCHEMBL9174313 0.74 PTGES (0.37) ELANEKDM4EHPGDHSD17B10PPARG
SCHEMBL8323879 0.73 ELANE (0.46) ELANEL3MBTL1KDM4EHPGDHSD17B10
SCHEMBL8781775 0.73 LMNA (0.42) PPARGPTGS2
Hydrochloric Acid SCHEMBL3868653 0.73 ELANE (0.36) ELANEL3MBTL1KDM4EHPGDHSD17B10
SCHEMBL5397237 0.72 CA1 (0.48) L3MBTL1POLBHTTNPSR1
SCHEMBL5393586 0.72 ALDH1A1 (0.50) L3MBTL1GLAKDM4EGAAHCRTR1
SCHEMBL353868 0.72 L3MBTL1 (0.68) L3MBTL1GLAKDM4EHPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0525626-B1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AG (DE) 1995-06-14 — — EP disclosed
EP-0525626-A1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 — — EP disclosed
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