SCHEMBL918052

SCHEMBL918052

CC(C)(C1=N[C@@H](C(C)(C)C)CO1)C1=N[C@@H](C(C)(C)C)CO1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL247952 1.00 CNR2 (0.31) CNR2
SCHEMBL3742324 1.00 CNR2 (0.31) CNR2
SCHEMBL31069784 1.00 CNR2 (0.31) CNR2
SCHEMBL1130554 1.00 CNR2 (0.31) CNR2
SCHEMBL2549969 0.90 ADRA2A (0.32)
SCHEMBL10227022 0.86 CNR2 (0.31) CNR2
SCHEMBL25860783 0.86
SCHEMBL17421987 0.83 CNR2 (0.30) CNR2
SCHEMBL12172138 0.79 CNR2 (0.32) CNR2
SCHEMBL22343067 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12331072-B2 Deprotection method and resin removal method in solid-phase reaction for peptide compound or amide compound, and method for producing peptide compound CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2025-06-17 US claimed
US-20230303619-A1 DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2023-09-28 US claimed
US-20200079790-A1 METHODS OF SELECTIVE ARYL- AND HETEROARYL-NITROGEN BOND FORMATION Janssen Sciences Ireland Unlimited Company (IE) 2020-03-12 US claimed
WO-2018170220-A1 METHODS OF SELECTIVE ARYL- AND HETEROARYL-NITROGEN BOND FORMATION JANSSEN SCIENCES IRELAND UC (BE) 2018-09-20 WO claimed
EP-2855419-B1 NEW INDANYLOXYPHENYLCYCLOPROPANECARB OXYLIC ACIDS BOEHRINGER INGELHEIM INT (DE) 2017-03-01 EP claimed
EP-1778759-B1 PHOTOSENSITIVE DIELECTRIC RESIN COMPOSITIONS AND THEIR USES PROMERUS LLC (US) 2008-11-12 EP claimed
US-6596898-B2 Making a 2-fluoro-2-chlorocyclopropanecarboxylic acid derivative stereoselectively in high yield by reacting a diazoacetic acid derivative with 1-fluoro-1-chloroethylene using metal catalyst having chiral ligands DAIICHI PHARMACEUTICAL CO., LTD. (JP) 2003-07-22 US claimed
US-12331072-B2 Deprotection method and resin removal method in solid-phase reaction for peptide compound or amide compound, and method for producing peptide compound CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2025-06-17 US disclosed
US-20250188116-A1 DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2025-06-12 US disclosed
WO-2025072614-A2 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO disclosed
WO-2025072607-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO disclosed
US-20250110403-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US disclosed
US-20250110399-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US disclosed
WO-2002068409-A1 N-SUBSTITUTED NONARYL-HETEROCYCLIC NMDA/NR2B ANTAGONISTS MERCK & CO., INC. (US) 2002-09-06 WO disclosed
US-20010051750-A1 PROCESS FOR PREPARING HALOGENATED CYCLOPROPANE DERIVATIVES DAIICHI PHARMACEUTICAL CO., LTD. (JP) 2001-12-13 US disclosed
EP-0858992-B1 PROCESS FOR PRODUCING HALOGENATED CYCLOPROPANE DERIVATIVES DAIICHI SEIYAKU CO (JP) 2001-12-12 EP disclosed
US-20010023302-A1 Process for producing optically active hemiesters SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-09-20 US disclosed
EP-1054867-A1 ANTIVIRALS MEDIVIR AB (SE) 2000-11-29 EP disclosed
WO-1999036406-A1 ANTIVIRALS MEDIVIR AB (SE) 1999-07-22 WO disclosed
EP-0858992-A1 PROCESS FOR PRODUCING HALOGENATED CYCLOPROPANE DERIVATIVES DAIICHI PHARMACEUTICAL CO., LTD. (JP) 1998-08-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12331072-B2 Deprotection method and resin removal method in solid-phase reaction for peptide compound or amide compound, and method for producing peptide compound VIP, PEPD, MLN CNR2 4260/4885
US-20200079790-A1 METHODS OF SELECTIVE ARYL- AND HETEROARYL-NITROGEN BOND FORMATION ABL1, CYP2F1, NBAS CNR2 962/4885
US-20010023302-A1 Process for producing optically active hemiesters ALDH1A2, CYP8B1, HCCS CNR2 2485/4885
US-20230303619-A1 DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND VIP, PEPD, MLN CNR2 4260/4885
US-20250188116-A1 DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND VIP, PEPD, MLN CNR2 4260/4885
US-20010051750-A1 PROCESS FOR PREPARING HALOGENATED CYCLOPROPANE DERIVATIVES CYP2F1, CYP4F2, CYP4F8 CNR2 134/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.