Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA9 | Q16790 | 2/20 | 0.42 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.41 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.41 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.41 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.41 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.41 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | GBA2 | Q9HCG7 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3126327 | 0.87 | ALDH1A1 (0.41) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL4806332 | 0.84 | CA12 (0.38) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL919679 | 0.83 | CA12 (0.46) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL31123487 | 0.82 | MEN1 (0.35) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL3126332 | 0.79 | ALDH1A1 (0.40) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL4802974 | 0.79 | SCN9A (0.35) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL19929334 | 0.79 | PKM (0.39) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL3236537 | 0.78 | — | — | |
| SCHEMBL12869523 | 0.78 | MEN1 (0.33) | ALDH1A1MEN1KMT2A | |
| SCHEMBL5547697 | 0.77 | CA12 (0.42) | CA12CA1CA2CA9GRIN2D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3486067-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2022-09-28 | — | — | EP | disclosed |
| US-11142653-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| US-11142617-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| EP-3485986-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2020-05-20 | — | — | EP | disclosed |
| US-20190300666-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KABUSHIKI KAISHA (JP) | 2019-10-03 | — | — | US | disclosed |
| US-20190233656-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | DAIKIN INDUSTRIES, LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3486067-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| EP-3485986-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-9522998-B2 | Resin mold material composition for imprinting | DAIKIN INDUSTRIES, LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20150064909-A1 | RESIN MOLD MATERIAL COMPOSITION FOR IMPRINTING | DAIKIN INDUSTRIES, LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20050004391-A1 | Adamantyl vinyl ether compound and production process for the same | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| US-6833230-B2 | Good adhesion and resistance to dry etching | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-21 | — | — | US | disclosed |
| EP-1486480-A1 | Adamantyl vinyl ether compound and production process for the same | Idemitsu Petrochemical Co., Ltd. (JP) | 2004-12-15 | — | — | EP | disclosed |
| US-6790587-B1 | POLYMER DERIVED FROM ETHYLENICALLY UNSATURATED MONOMER COMPRISING FLUOROALCOHOL FUNCTIONAL GROUP AND PHOTOACTIVE COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-09-14 | — | — | US | disclosed |
| US-20030194643-A1 | Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-10-16 | — | — | US | disclosed |
| US-20030083529-A1 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-1183571-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-03-06 | — | — | EP | disclosed |
| WO-2000067072-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-11-09 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050004391-A1 | Adamantyl vinyl ether compound and production process for the same | NOTUM, CYP4A11, CYP4F11 | CA12 2410/4885CA1 1929/4885CA2 3361/4885 |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | CA12 4180/4885CA1 3222/4885CA2 4070/4885 |
| US-20030083529-A1 | Process for producing vinyl ether compounds | SRD5A2, RPS4X, RUVBL2 | CA12 2870/4885CA1 2335/4885CA2 2951/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.