SCHEMBL9220858

SCHEMBL9220858

O=C(O)c1cc2c(cc1C(=O)O)C(c1ccccc1)(C(F)(F)F)c1cc3c(cc1O2)Oc1cc(C(=O)O)c(C(=O)O)cc1C3(c1ccccc1)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 4/20 0.36
KMT2A Q03164 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
ALOX5 P09917 2/20 0.35
CYP2C9 P11712 1/20 0.34
MEN1 O00255 1/20 0.34
HSD17B10 Q99714 3/20 0.33
CDC25A P30304 1/20 0.33
CDC25B P30305 1/20 0.33
NOTUM Q6P988 1/20 0.33
PTGER4 P35408 1/20 0.32
ALDH1A1 P00352 3/20 0.32
KDM4E B2RXH2 2/20 0.32
HPGD P15428 2/20 0.32
ALOX15 P16050 1/20 0.32
CNR1 P21554 1/20 0.32
HCAR3 P49019 1/20 0.32
HCAR2 Q8TDS4 1/20 0.32
RXRA P19793 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1099586 0.97 PDK2 (0.38) PDK2KMT2ANPC1RAB9AALOX5
SCHEMBL9221863 0.96 PDK2 (0.37) PDK2KMT2ANPC1RAB9AALOX5
SCHEMBL9215677 0.89 KMT2A (0.34) PDK2KMT2ANPC1RAB9AALOX5
SCHEMBL9455620 0.89 PDK2 (0.33) PDK2ALOX5CYP2C9HSD17B10CDC25A
SCHEMBL9455626 0.87 CA12 (0.37) PDK2ALOX5CYP2C9RXRARXRB
SCHEMBL9223436 0.87 KMT2A (0.33) PDK2KMT2ANPC1RAB9AALOX5
SCHEMBL9220689 0.86 ALOX5 (0.35) PDK2KMT2ANPC1RAB9AALOX5
SCHEMBL23149786 0.85 ALDH1A1 (0.40) PDK2HSD17B10CDC25ACDC25BNOTUM
SCHEMBL9223896 0.84 ALOX5 (0.33) PDK2KMT2AALOX5CYP2C9MEN1
SCHEMBL9455519 0.81 PDK2 (0.31) PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4338391-A None JP disclosed
US-9024312-B2 Substrate for flexible device, thin film transistor substrate for flexible device, flexible device, substrate for thin film element, thin film element, thin film transistor, method for manufacturing substrate for thin film element, method for manufacturing thin film element, and method for manufacturing thin film transistor DAI NIPPON PRINTING CO., LTD. (JP) 2015-05-05 US disclosed
US-20120187399-A1 SUBSTRATE FOR FLEXIBLE DEVICE, THIN FILM TRANSISTOR SUBSTRATE FOR FLEXIBLE DEVICE, FLEXIBLE DEVICE, SUBSTRATE FOR THIN FILM ELEMENT, THIN FILM ELEMENT, THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SUBSTRATE FOR THIN FILM ELEMENT, METHOD FOR MANUFACTURING THIN FILM ELEMENT, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR DAI NIPPON PRINTING CO., LTD. (JP) 2012-07-26 US disclosed
WO-1995004305-A1 PHOTOSENSITIVE FLUORINATED POLY(AMIC ACID) AMINOACRYLATE SALT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-02-09 WO disclosed
US-5189138-A COMPOUNDS, MONOMERS, AND POLYMERS BASED ON PERFLUOROALKYL AND PERFLUOROALKYL-ARYL DIOXAPENTACENE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-02-23 US disclosed
JP-H04338391-A COMPOUND, MONOMER AND POLYMER BASED ON PERFLUOROALKYL AND PERFLUOROALKYL-ARYL DIOXAPENTACENE E I DU PONT DE NEMOURS & CO 1992-11-25 JP disclosed
EP-0500026-A1 Compounds, monomers, and polymers based on perfluoroalkyl and perfluoroalkyl-aryl dioxapentacene E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-08-26 EP disclosed