SCHEMBL92326

SCHEMBL92326

C=C(C)C(=O)OCc1ccc(O)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.53
KMT2A Q03164 1/20 0.53
ALDH1A1 P00352 1/20 0.46
LMNA P02545 1/20 0.44
TSHR P16473 1/20 0.42
IDO1 P14902 2/20 0.42
KDM4E B2RXH2 1/20 0.42
F13A1 P00488 1/20 0.42
ESR1 P03372 3/20 0.41
ESR2 Q92731 3/20 0.41
CA2 P00918 3/20 0.41
CAMK2A Q9UQM7 1/20 0.41
MET P08581 1/20 0.40
THRB P10828 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL254038 0.94 ALDH1A1 (0.50) MEN1KMT2AALDH1A1TSHRTHRB
SCHEMBL24019226 0.89 ALDH1A1 (0.46) MEN1KMT2AALDH1A1TSHRTHRB
SCHEMBL16125663 0.89 ALDH1A1 (0.46) MEN1KMT2AALDH1A1TSHRTHRB
SCHEMBL15944747 0.89 ALDH1A1 (0.46) MEN1KMT2AALDH1A1TSHRKDM4E
SCHEMBL17791311 0.89 ALDH1A1 (0.46) MEN1KMT2AALDH1A1TSHRKDM4E
SCHEMBL4354853 0.87 ALDH1A1 (0.44) MEN1KMT2AALDH1A1LMNATSHR
SCHEMBL10720993 0.87 ALDH1A1 (0.44) MEN1KMT2AALDH1A1TSHRKDM4E
SCHEMBL148297 0.87 MAOB (0.47) ALDH1A1TSHRCA2CA1CA9
SCHEMBL9554958 0.87 ALDH1A1 (0.44) MEN1KMT2AALDH1A1TSHRTHRB
SCHEMBL451263 0.85 KDM4E (0.50) MEN1KMT2AALDH1A1IDO1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 389 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111123644-A Photosensitive resin composition, display, and method for forming pattern of display 株式会社东进世美肯 2020-05-08 CN claimed
CN-104781731-B Positive-working light-sensitive material AZ电子材料卢森堡有限公司 2019-12-03 CN claimed
CN-104781731-A Positive working photosensitive material AZ ELECTRONIC MATERIALS LUXEMBOURG SARL 2015-07-15 CN claimed
US-5340888-A Curable mixture of phenolic novolak resin, esterified phenolic compound and base; for foundry molds, cores BORDEN INC. (US) 1994-08-23 US claimed
EP-0377308-B1 Phenolic resins BORDEN UK LTD (GB) 1993-11-03 EP claimed
US-5051454-A An esterified phenolic compound, an unesterified phenolic resole and a base and curing BORDEN, INC. (US) 1991-09-24 US claimed
EP-0377308-A1 Phenolic resins BORDEN (UK) LIMITED (GB) 1990-07-11 EP claimed
WO-1990006904-A2 PHENOLIC RESINS BORDEN (UK) LIMITED (GB) 1990-06-28 WO claimed
US-4032592-A G-METHACRYLOYLOXYPROPYL TRIMETHOXYSILANE MODIFIER UBE INDUSTRIES, LTD. (JA) 1977-06-28 US claimed
US-3970722-A Method for preparing a modified crystalline propylene polymer UBE INDUSTRIES, LTD. (JA) 1976-07-20 US claimed
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
CN-112241107-B Positive photosensitive resin composition, photosensitive resin film and display device using the same 株式会社东进世美肯 2025-03-11 CN disclosed
WO-2025005113-A1 COPOLYMER, PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND ORGANIC EL DISPLAY DEVICE 東レ株式会社 2025-01-02 WO disclosed
CN-111123644-B Photosensitive resin composition, display, and method for forming pattern of display 株式会社东进世美肯 2024-09-03 CN disclosed
EP-0430215-A2 Wear-resistant polyoxymethylene resin composition and method for making same Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1991-06-05 EP disclosed
US-4636452-A POLARITY, SOLUBILITY, POLYMER, ADSORPTION, POLAR MONOMER POLYMERIZATION, INSOLUBILITY MITSUBISHI PAPER MILLS. LTD. (JP) 1987-01-13 US disclosed
US-4063014-A ANTIBIOTICS ABBOTT LABORATORIES (US) 1977-12-13 US disclosed
US-4032592-A G-METHACRYLOYLOXYPROPYL TRIMETHOXYSILANE MODIFIER UBE INDUSTRIES, LTD. (JA) 1977-06-28 US disclosed
US-3970722-A Method for preparing a modified crystalline propylene polymer UBE INDUSTRIES, LTD. (JA) 1976-07-20 US disclosed