SCHEMBL9244264

SCHEMBL9244264

C=CCN1C(=O)c2ccc(O)cc2C1=O

nearest known ligand 0.56

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CASP3 P42574 1/20 0.56
ESR1 P03372 7/20 0.50
ESR2 Q92731 4/20 0.50
ALDH1A1 P00352 2/20 0.47
POLB P06746 1/20 0.47
RXFP1 Q9HBX9 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.45
ANPEP P15144 2/20 0.45
DPP4 P27487 2/20 0.45
MAOA P21397 1/20 0.42
UGT1A1 P22309 1/20 0.42
MAOB P27338 1/20 0.42
MEN1 O00255 1/20 0.42
CRHBP P24387 1/20 0.42
MAPK1 P28482 1/20 0.42
KMT2A Q03164 1/20 0.42
CRHR2 Q13324 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26361645 0.82 CASP3 (0.59) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL6824607 0.80 ALDH1A1 (0.59) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL11045205 0.79 CASP3 (0.56) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL15046563 0.79 CASP3 (0.56) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL4725575 0.79 CASP3 (0.56) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL9778204 0.79 CASP3 (0.60) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL29506649 0.79 POLB (0.65) CASP3ALDH1A1POLBL3MBTL1MEN1
SCHEMBL1547024 0.79 POLB (0.65) CASP3ALDH1A1POLBL3MBTL1MEN1
SCHEMBL6827846 0.78 TDP1 (0.58) CASP3ALDH1A1POLBRXFP1L3MBTL1
SCHEMBL1547317 0.78 L3MBTL1 (0.53) CASP3ALDH1A1POLBRXFP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5380926-A Reacting a tetrafluorophthalimide with alkali metal hydroxide to form alkali salts of 4-hydroxy-3,5,6-trifluorophthalamic acids and 3-hydroxy-2,4,5-trifluorobenzamides, methylation, acidification, decarboxylation OCCIDENTAL CHEMICAL CORPORATION (US) 1995-01-10 US claimed
US-7655389-B2 Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-02-02 US disclosed
US-7655389-B2 Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-02-02 US disclosed
US-20070184648-A1 Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-09 US disclosed
US-20070184648-A1 Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-09 US disclosed