Benzo[D]Thiazole

Benzo[D]Thiazole

SCHEMBL9300997

Clc1ccc2scnc2c1.c1ccc2scnc2c1

nearest known ligand 0.68

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.68
HSD17B10 Q99714 1/20 0.68
HSD11B1 P28845 1/20 0.44
NPC1 O15118 4/20 0.42
RAB9A P51151 4/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
POLB P06746 1/20 0.42
RXFP1 Q9HBX9 1/20 0.42
IDO1 P14902 1/20 0.40
PIK3CD O00329 1/20 0.40
TRPM5 Q9NZQ8 1/20 0.39
MAPK8 P45983 1/20 0.38
GLRA3 O75311 1/20 0.38
GLRB P48167 1/20 0.38
NR4A2 P43354 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
PKM P14618 1/20 0.38
KDM4E B2RXH2 2/20 0.38
PTGS1 P23219 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL584449 0.91 ALDH1A1 (0.50) ALDH1A1HSD17B10HSD11B1NPC1RAB9A
SCHEMBL29354147 0.91 ALDH1A1 (0.50) ALDH1A1HSD17B10HSD11B1NPC1RAB9A
SCHEMBL8062628 0.87 NPC1 (0.49) ALDH1A1HSD17B10HSD11B1NPC1RAB9A
Ethane SCHEMBL27952962 0.87 HSD11B1 (0.48) ALDH1A1HSD17B10HSD11B1NPC1RAB9A
Hydrazine SCHEMBL27534771 0.87 HSD11B1 (0.48) ALDH1A1HSD17B10HSD11B1NPC1RAB9A
Benzo[D]Thiazole SCHEMBL23521064 0.84 HSD17B10 (0.51) ALDH1A1HSD17B10NPC1RAB9AKMT2A
Benzo[D]Thiazole SCHEMBL31388426 0.82
Benzo[D]Thiazole SCHEMBL10847268 0.82
Benzo[D]Thiazole SCHEMBL451685 0.82
Benzo[D]Thiazole SCHEMBL900814 0.82 ALDH1A1 (1.00) ALDH1A1HSD17B10NPC1RAB9AIDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5338640-A Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1994-08-16 US disclosed