Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2109556 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL93215 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL2109539 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL9431 | 1.00 | — | — | |
| SCHEMBL302897 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL93249 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL2110868 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL93454 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL2108202 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE | |
| SCHEMBL2109113 | 1.00 | CA1 (0.39) | CA1CA2ALDH1A1EPHX1ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-20190101825-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-04 | — | — | US | disclosed |
| US-20180259853-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| EP-2426488-B1 | MEASUREMENT METHOD UTILIZING INTERNAL STANDARD SUBSTANCE | WAKO PURE CHEM IND LTD (JP) | 2016-04-20 | — | — | EP | disclosed |
| US-9255070-B2 | Method of deuteration using mixed catalyst | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-02-09 | — | — | US | disclosed |
| EP-1903069-B1 | NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH | WAKO PURE CHEM IND LTD (JP) | 2015-08-12 | — | — | EP | disclosed |
| US-20080234488-A1 | Method of Deuteration Using Mixed Catalyst | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| EP-1903069-A1 | NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH | Wako Pure Chemical Industries, Ltd. (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-20070255076-A1 | Method for Deuteration of an Aromatic Ring | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2007-11-01 | — | — | US | disclosed |
| EP-1707548-A1 | METHOD OF DEUTERATION USING MIXED CATALYST | Wako Pure Chemical Industries, Ltd. (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-20060025596-A1 | Method for deuteration or tritiation of heterocyclic ring | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1561741-A1 | METHOD FOR DEUTERATION OR TRITIATION OF HETEROCYCLIC RING | Wako Pure Chemical Industries, Ltd. (JP) | 2005-08-10 | — | — | EP | disclosed |
| EP-1535889-A1 | METHOD OF DEUTERATING AROMATIC RING | Wako Pure Chemical Industries, Ltd. (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-5948774-A | EXCELLENT ANTIBACTERIAL ACTIVITIES ON A BROAD RANGE OF GRAM-POSITIVE AND GRAM-NEGATIVE BACTERIA, ESPECIALLY STAPHYLOCOCCUS AUREUS AND METHICILLIN-RESISTANT STAPHYLOCOCCUS AUREUS (MRSA) | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0828744-A1 | CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE | Takeda Chemical Industries, Ltd. (JP) | 1998-03-18 | — | — | EP | disclosed |
| WO-1996038451-A1 | CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1996-12-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060025596-A1 | Method for deuteration or tritiation of heterocyclic ring | HRH2, HRH4, HDHD5 | CA1 112/4885CA2 1154/4885ALDH1A1 1829/4885 |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | CUTA, POLR1C, ASIC1 | CA1 1530/4885CA2 2418/4885ALDH1A1 639/4885 |
| US-20080234488-A1 | Method of Deuteration Using Mixed Catalyst | HDHD5, DHX35, HRH3 | CA1 486/4885CA2 1953/4885ALDH1A1 3168/4885 |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | CUTA, RAD51, PCNA | CA1 1495/4885CA2 1754/4885ALDH1A1 565/4885 |
| US-20070255076-A1 | Method for Deuteration of an Aromatic Ring | HRH3, HRH4, AHR | CA1 1012/4885CA2 2529/4885ALDH1A1 2654/4885 |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | CUTA, POLR1C, ASIC1 | CA1 1530/4885CA2 2418/4885ALDH1A1 639/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.