SCHEMBL93205

SCHEMBL93205

O=COC1CCCCCCCCC1

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
ADH1A P07327 10/20 0.36
ADH1C P00326 8/20 0.36
ADH1B P00325 4/20 0.36
ADH4 P08319 3/20 0.36
EPHX1 P07099 2/20 0.33
ACHE P22303 1/20 0.33
ADH7 P40394 2/20 0.32
CA12 O43570 1/20 0.32
CA9 Q16790 1/20 0.32
NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL302898 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL2109114 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL93455 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL2110870 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL2108204 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL2109558 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL2109541 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL9432 1.00
SCHEMBL93216 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B
SCHEMBL3627527 1.00 CA1 (0.39) CA1CA2ADH1AADH1CADH1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250212873-A1 VOLATILE HDAC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2025-07-03 US claimed
EP-4482306-A1 VOLATILE HDAC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2025-01-01 EP claimed
WO-2023192424-A1 VOLATILE HD AC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS CROSS-REFERENCE TO RELATED APPLICATION THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2023-10-05 WO claimed
US-20250212873-A1 VOLATILE HDAC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2025-07-03 US disclosed
EP-4482306-A1 VOLATILE HDAC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2025-01-01 EP disclosed
CN-109709770-B Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound 东京应化工业株式会社 2023-11-24 CN disclosed
WO-2023192424-A1 VOLATILE HD AC INHIBITORS FOR THERAPEUTIC AND PLANT APPLICATIONS CROSS-REFERENCE TO RELATED APPLICATION THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2023-10-05 WO disclosed
CN-116745378-A Active energy ray-curable adhesive sheet, adhesive sheet laminate with release film, adhesive sheet, laminate for image display device construction, and image display device 三菱化学株式会社 2023-09-12 CN disclosed
CN-111801090-B Film for sticking living body and cosmetic method for sticking film for sticking living body 松下知识产权经营株式会社 2023-03-07 CN disclosed
US-11061326-B2 Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-07-13 US disclosed
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-01 US disclosed
EP-1707548-A1 METHOD OF DEUTERATION USING MIXED CATALYST Wako Pure Chemical Industries, Ltd. (JP) 2006-10-04 EP disclosed
US-20060025596-A1 Method for deuteration or tritiation of heterocyclic ring FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2006-02-02 US disclosed
EP-1561741-A1 METHOD FOR DEUTERATION OR TRITIATION OF HETEROCYCLIC RING Wako Pure Chemical Industries, Ltd. (JP) 2005-08-10 EP disclosed
EP-1535889-A1 METHOD OF DEUTERATING AROMATIC RING Wako Pure Chemical Industries, Ltd. (JP) 2005-06-01 EP disclosed
CN-1495043-A Lithographic printing carrier, method for mfg. carrier and pre-sensitized board ��ʿ��Ƭ��ʽ���� 2004-05-12 CN disclosed
CN-1446701-A Planography strut attachment, mfg. method for original plate of planography printing plate and planography printing plate FUJI PHOTO FILM CO LTD (JP) 2003-10-08 CN disclosed
US-5948774-A EXCELLENT ANTIBACTERIAL ACTIVITIES ON A BROAD RANGE OF GRAM-POSITIVE AND GRAM-NEGATIVE BACTERIA, ESPECIALLY STAPHYLOCOCCUS AUREUS AND METHICILLIN-RESISTANT STAPHYLOCOCCUS AUREUS (MRSA) TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1999-09-07 US disclosed
EP-0828744-A1 CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 1998-03-18 EP disclosed
WO-1996038451-A1 CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1996-12-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060025596-A1 Method for deuteration or tritiation of heterocyclic ring HRH2, HRH4, HDHD5 CA1 112/4885CA2 1154/4885ADH1A 960/4885
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound CUTA, POLR1C, ASIC1 CA1 1530/4885CA2 2418/4885ADH1A 1502/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.