Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11259985 | 0.90 | CA12 (0.33) | — | |
| SCHEMBL11264128 | 0.90 | CA12 (0.33) | — | |
| SCHEMBL10618065 | 0.88 | CA12 (0.33) | HTR2CHTR2B | |
| SCHEMBL3877465 | 0.88 | CA12 (0.33) | HTR2CHTR2B | |
| SCHEMBL11269716 | 0.88 | HTR2C (0.41) | HTR2C | |
| SCHEMBL9547576 | 0.85 | — | — | |
| SCHEMBL8685158 | 0.84 | HTR2C (0.41) | HTR2CHTR2B | |
| SCHEMBL4005975 | 0.84 | CYP2C19 (0.35) | — | |
| SCHEMBL11586220 | 0.78 | HTR2C (0.38) | HTR2CHTR2BP2RX4 | |
| SCHEMBL11233878 | 0.77 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0410276-B1 | Graft polymer with unsaturated side groups, light-sensitive mixture containing same and recording material made from same | HOECHST AG (DE) | 1994-05-11 | — | — | EP | disclosed |
| EP-0230941-B1 | PHOTOPOLYMERISABLE COMPOSITION AND PHOTOPOLYMERISABLE REGISTRATION MATERIAL CONTAINING IT | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-09 | — | — | EP | disclosed |
| EP-0280979-B1 | LIGHT-SENSITIVE REGISTRATION MATERIAL WITH ENHANCED FLEXIBILITY | BASF Aktiengesellschaft (DE) | 1992-06-03 | — | — | EP | disclosed |
| US-5073475-A | PRODUCTION OF PLATE-LIKE, SHEET-LIKE OR TAPE-LIKE MATERIALS AND OF SENSITIZED LITHOGRAPHIC PRINTING PLATES | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-17 | — | — | US | disclosed |
| US-5061602-A | PHOTOSENSITIVE RECORDING MATERIAL OF ENHANCED FLEXIBILITY | BASF AKTIENGESELLSCHAFT (DE) | 1991-10-29 | — | — | US | disclosed |
| EP-0434968-A2 | Light-sensitive preparation and process for the fabrication of photoresists and printing plates | BASF Aktiengesellschaft (DE) | 1991-07-03 | — | — | EP | disclosed |
| EP-0415302-A2 | Graft polymers with unsaturated side chains, light sensitive compositions containing them and coating composition with these polymers | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-06 | — | — | EP | disclosed |
| EP-0410276-A2 | Graft polymer with unsaturated side groups, light-sensitive mixture containing same and recording material made from same | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-01-30 | — | — | EP | disclosed |
| EP-0388875-A2 | Light sensitive preparation, and process for the fabrication of photoresistors and printing plates | BASF Aktiengesellschaft (DE) | 1990-09-26 | — | — | EP | disclosed |
| EP-0071789-B2 | Photopolymerisable transfer material suitable for the production of photoresist layers | BASF Aktiengesellschaft (DE) | 1990-08-08 | — | — | EP | disclosed |
| US-4842987-A | Photosensitive element for producing printing plates or resist images | BASF AKTIENGESELLSCHAFT (DE) | 1989-06-27 | — | — | US | disclosed |
| US-4780393-A | POLYMERIC BINDER, TERMINAL ETHYLENIC COMPOUND, PHOTOINITIATOR, LEVCO BASE OF TRIARYLMETHANE DYE AND PHOTOC ROMIC SPIRO-INDOLINO-BENZOPYRAN COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-10-25 | — | — | US | disclosed |
| EP-0230941-A2 | Photopolymerisable composition and photopolymerisable registration material containing it | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-08-05 | — | — | EP | disclosed |
| US-4632897-A | Photopolymerizable recording material suitable for the production of photoresist layers | BASF AKTIENGESELLSCHAFT (DE) | 1986-12-30 | — | — | US | disclosed |
| EP-0071789-B1 | Photopolymerisable transfer material suitable for the production of photoresist layers | BASF Aktiengesellschaft (DE) | 1986-06-04 | — | — | EP | disclosed |