SCHEMBL9359142

SCHEMBL9359142

C=CC(=O)NCc1cccc2c(O)cccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 6/20 0.47
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
MAPT P10636 1/20 0.39
FYN P06241 1/20 0.39
SRC P12931 1/20 0.39
CA2 P00918 1/20 0.37
ALDH1A1 P00352 3/20 0.37
TSHR P16473 1/20 0.37
MAPK1 P28482 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
GAA P10253 1/20 0.37
CHRNB2 P17787 1/20 0.36
CHRNA4 P43681 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
EGFR P00533 1/20 0.35
BTK Q06187 1/20 0.35
LMNA P02545 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9330458 0.91 TGM2 (0.47) TGM2KMT2AFYNSRCALDH1A1
SCHEMBL410698 0.83 TSHR (0.52) TGM2KMT2ACA2ALDH1A1TSHR
SCHEMBL9185736 0.83 TGM2 (0.46) TGM2KMT2AMEN1MAPTFYN
SCHEMBL647494 0.83 MEN1 (0.57) TGM2KMT2AMEN1MAPTFYN
SCHEMBL59858 0.79 TGM2 (0.55) TGM2KMT2AALDH1A1TSHRMAPK1
SCHEMBL29084201 0.78 TGM2 (0.47) TGM2KMT2AALDH1A1TSHRMAPK1
SCHEMBL2449430 0.77 TGM2 (0.53) TGM2KMT2AALDH1A1TSHRMAPK1
SCHEMBL29264300 0.77 TGM2 (0.40) TGM2KMT2AMAPTALDH1A1TSHR
SCHEMBL28165255 0.76 MEN1 (0.43) TGM2KMT2AMEN1MAPTFYN
SCHEMBL13612034 0.75 MEN1 (0.39) KMT2AMEN1MAPTCA2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0287212-B1 Positive photosensitive planographic printing plate MITSUBISHI CHEM IND (JP) 1994-12-28 EP disclosed
US-5182183-A Chemical resistance; printing durability MITSUBISHI KASEI CORPORATION (JP) 1993-01-26 US disclosed
EP-0184044-B1 LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-15 EP disclosed
EP-0287212-A1 Positive photosensitive planographic printing plate Mitsubishi Chemical Corporation (JP) 1988-10-19 EP disclosed
EP-0184044-A2 Light-sensitive composition, registration material prepared thereof, and process for obtaining heat-resistant relief images HOECHST AKTIENGESELLSCHAFT (DE) 1986-06-11 EP disclosed
US-4442196-A ADDITION POLYMER HAVING SOME AZIDO-CINNAMYLIDENE-ALPHA-CYANOACETATE GROUPS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-04-10 US disclosed
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed
US-4229514-A Photosensitive composition KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1980-10-21 US disclosed