SCHEMBL410698

SCHEMBL410698

C=CC(=O)NCc1ccccc1O

nearest known ligand 0.68

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
HIF1A Q16665 2/20 0.52
CYP2D6 P10635 1/20 0.52
TGM2 P21980 2/20 0.49
CA12 O43570 6/20 0.48
CA2 P00918 6/20 0.48
CA9 Q16790 5/20 0.47
KDM4E B2RXH2 1/20 0.46
HSD17B10 Q99714 1/20 0.46
AKR1B1 P15121 1/20 0.46
MPO P05164 2/20 0.44
GAA P10253 1/20 0.44
KMT2A Q03164 1/20 0.44
PKM P14618 1/20 0.43
SLC6A4 P31645 1/20 0.42
ALDH1A1 P00352 1/20 0.42
MAPK1 P28482 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
HSPA5 P11021 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL59858 0.89 TGM2 (0.55) TSHRCYP2D6TGM2GAAKMT2A
SCHEMBL9359142 0.83 TGM2 (0.47) TSHRCYP2D6TGM2CA2GAA
SCHEMBL4327593 0.83 MPO (0.50) TGM2CA12CA2AKR1B1MPO
SCHEMBL2449430 0.82 TGM2 (0.53) TSHRCYP2D6TGM2GAAKMT2A
SCHEMBL15938100 0.81 ALDH1A1 (0.49) TSHRCYP2D6TGM2KDM4EHSD17B10
SCHEMBL8765327 0.81 NPC1 (0.66) KMT2AALDH1A1
SCHEMBL5082541 0.81 KMT2A (0.67) TGM2CA2KDM4EGAAKMT2A
SCHEMBL9330458 0.80 TGM2 (0.47) TSHRCYP2D6TGM2GAAKMT2A
SCHEMBL23805011 0.79 TSHR (0.57) TSHRHIF1ACYP2D6CA12CA2
SCHEMBL30345122 0.79 TGM2 (0.49) TSHRTGM2GAAKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 EP claimed
EP-0914964-B1 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO LTD (JP) 2004-12-29 EP claimed
US-6635719-B2 Aminoplast resin/thermoplastic polyamide presize coatings for abrasive article backings 3M INNOVATIVE PROPERTIES COMPANY 2003-10-21 US claimed
EP-1141125-B1 AMINOPLAST RESIN/THERMOPLASTIC POLYAMIDE PRESIZE COATINGS FOR ABRASIVE ARTICLE BACKINGS 3M INNOVATIVE PROPERTIES CO (US) 2002-12-04 EP claimed
US-6355396-B1 HIGH SENSITIVITY AND GOOD LATITUDE IN DEVELOPMENT, FOR PRODUCING DIRECT PLATE PRODUCTION PROCESS AND ENABLES AN IMAGE TO BE FORMED WITH HIGH SENSITIVITY WITH AN INFRARED LASER FUJI PHOTO FILM CO., LTD. (JP) 2002-03-12 US claimed
US-20010023158-A1 Aminoplast resin/thermoplastic polyamide presize coatings for abrasive article backings 3M INNOVATIVE PROPERTIES COMPANY 2001-09-20 US claimed
US-6132929-A Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US claimed
EP-1038668-A2 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP claimed
EP-0914964-A2 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 1999-05-12 EP claimed
US-12630795-B2 Cell culture substrate, method for producing cell culture substrate, and method for producing spheroids TOSOH CORPORATION (JP) 2026-05-19 US disclosed
EP-4714657-A1 POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM Corporation (JP) 2026-03-25 EP disclosed
EP-4685230-A1 METHOD FOR PRODUCING NEURAL ORGANOIDS AND USE OF SAME KYOTO UNIVERSITY (JP) 2026-01-28 EP disclosed
US-20260021192-A1 PROTEINS HAVING A COVALENT WARHEAD TOPAZ THERAPEUTICS INC (US) 2026-01-22 US disclosed
WO-2025105395-A1 CELL CULTURE SUBSTRATE, METHOD FOR PRODUCING SAME, AND CELL CULTURE KIT 東ソー株式会社 2025-05-22 WO disclosed
EP-0490269-B1 Graft copolymer and process for producing the same IDEMITSU KOSAN CO (JP) 1996-02-28 EP disclosed
WO-1995011774-A1 ABRASIVE ARTICLES INCORPORATING ADDITION POLYMERIZABLE RESINS AND REACTIVE DILUENTS, AND METHODS OF MAKING SAID ABRASIVE ARTICLES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-05-04 WO disclosed
US-5326840-A Radiation-sensitive mixture containing novel polymers embodying units composed of amides of α, β-unsaturated carboxylic acids as binders HOECHST AKTIENGESELLSCHAFT (DE) 1994-07-05 US disclosed
US-5250629-A Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts IDEMITSU KOSAN CO., LTD. (JP) 1993-10-05 US disclosed
EP-0505972-A2 Process for producing styrenic copolymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-09-30 EP disclosed
EP-0490269-A1 Graft copolymer and process for producing the same IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-06-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12630795-B2 Cell culture substrate, method for producing cell culture substrate, and method for producing spheroids MKI67, CCNB1, CD44 TSHR 1378/4885HIF1A 127/4885CYP2D6 4626/4885
US-20260021192-A1 PROTEINS HAVING A COVALENT WARHEAD RIOX2, ORC3, DCLRE1A TSHR 2255/4885HIF1A 3118/4885CYP2D6 4329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.