SCHEMBL59858

SCHEMBL59858

C=CC(=O)NCc1ccccc1CNC(=O)C=C

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 4/20 0.55
KMT2A Q03164 2/20 0.49
GAA P10253 1/20 0.49
ALDH1A1 P00352 6/20 0.48
TSHR P16473 1/20 0.48
MAPK1 P28482 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
NPC1 O15118 1/20 0.46
RAB9A P51151 1/20 0.46
CYP2C19 P33261 2/20 0.43
LMNA P02545 2/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 2/20 0.42
CYP3A4 P08684 1/20 0.42
HPGD P15428 2/20 0.41
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
TAAR1 Q96RJ0 1/20 0.40
AKT1 P31749 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2449430 0.93 TGM2 (0.53) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL410698 0.89 TSHR (0.52) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL8765327 0.87 NPC1 (0.66) KMT2AALDH1A1NPC1RAB9A
SCHEMBL15938100 0.87 ALDH1A1 (0.49) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL5082541 0.87 KMT2A (0.67) TGM2KMT2AGAAALDH1A1NPC1
SCHEMBL7838836 0.86 HTT (0.49) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL24112688 0.84 TGM2 (0.45) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL16634646 0.84 TGM2 (0.45) TGM2KMT2AGAAALDH1A1TSHR
SCHEMBL647494 0.84 MEN1 (0.57) TGM2KMT2AALDH1A1TDP1
SCHEMBL8764868 0.84 KMT2A (0.47) TGM2KMT2AGAARAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040063034-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-04-01 US claimed
EP-1403041-A2 Infrared-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2004-03-31 EP claimed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
US-5250385-A Photosensitivity, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US claimed
CN-119689782-A Polymerization inhibition system and photopolymerization type lithographic printing plate 乐凯华光印刷科技有限公司 2025-03-25 CN disclosed
CN-114051459-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-07-23 CN disclosed
CN-118046659-A Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-05-17 CN disclosed
CN-114072290-B On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-04-30 CN disclosed
CN-117881547-A On-press development type lithographic printing plate precursor and method for producing printing plate 富士胶片株式会社 2024-04-12 CN disclosed
CN-114450161-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-04-02 CN disclosed
CN-114531860-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-01-30 CN disclosed
CN-114126889-B Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method 富士胶片株式会社 2024-01-26 CN disclosed
US-4292152-A UNSATURATED MONOMER, BINDER BASF AKTIENGESELLSCHAFT (DE) 1981-09-29 US disclosed
US-4258123-A UNSATURATED COMPOUND, HALOGENATED TRIAZINE, UNSATURATED KETONE FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed
US-4239609-A PHOTORESISTS, RELIEF IMAGES BASF AKTIENGESELLSCHAFT (DE) 1980-12-16 US disclosed
US-4198241-A PHOTOINITIATOR, UNSATURATED MONOMER, POLYMERIC BINDER, ETHERIFIED THIOANTHRAQUINONE BASF AKTIENGESELLSCHAFT (DE) 1980-04-15 US disclosed
EP-0007508-A2 Acylphosphinoxide compounds, their preparation and their use BASF Aktiengesellschaft (DE) 1980-02-06 EP disclosed
US-4175964-A SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS FUJI PHOTO FILM CO., LTD. (JP) 1979-11-27 US disclosed
EP-0002805-A1 Photopolymerizable coating and registration materials,such as transfer foils with a photosensible coating and photoresist materials, containing a photoinitiator and an organic halogen compound BASF Aktiengesellschaft (DE) 1979-07-11 EP disclosed
US-4023973-A PRINTING JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1977-05-17 US disclosed