SCHEMBL9404022

SCHEMBL9404022

COS(=O)(=O)c1cc(CCC(=O)C(=[N+]=[N-])C(=O)CCc2ccc(C)c(S(=O)(=O)OC)c2)ccc1C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 9/20 0.33
MAPT P10636 3/20 0.33
KMT2A Q03164 2/20 0.32
KDM4E B2RXH2 2/20 0.32
NPC1 O15118 1/20 0.32
TP53 P04637 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAOA P21397 1/20 0.32
SLC6A2 P23975 1/20 0.32
RAB9A P51151 1/20 0.32
SLC6A3 Q01959 1/20 0.32
FFAR4 Q5NUL3 2/20 0.32
ALOX5 P09917 1/20 0.32
OR51E2 Q9H255 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
HPGD P15428 1/20 0.31
IDO1 P14902 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9404009 0.88 LMNA (0.34) LMNASMN1; SMN2ALDH1A1MAPTKMT2A
SCHEMBL9404004 0.86 POLB (0.43) LMNASMN1; SMN2ALDH1A1MAPTFFAR4
SCHEMBL9403996 0.85 ALDH1A1 (0.35) LMNASMN1; SMN2ALDH1A1KMT2AFFAR1
Ammonia Solution, Strong SCHEMBL9404030 0.85 POLB (0.42) LMNASMN1; SMN2ALDH1A1MAPTFFAR4
SCHEMBL9403985 0.81 SMN1; SMN2 (0.43) LMNASMN1; SMN2ALDH1A1MAPTKMT2A
SCHEMBL9404006 0.77 ALOX5 (0.39) LMNASMN1; SMN2ALDH1A1KMT2ANPC1
SCHEMBL9403988 0.76 ALOX5 (0.38) LMNASMN1; SMN2ALDH1A1ALOX5
SCHEMBL9403998 0.75 ALDH1A1 (0.42) LMNAALDH1A1KMT2AIDO1
SCHEMBL9404002 0.73 PLAAT3 (0.37) LMNAALDH1A1MAPTRAB9ATDP1
SCHEMBL8748624 0.72 PLAAT3 (0.49) LMNASMN1; SMN2ALDH1A1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0323050-B1 Photosensitive compound WAKO PURE CHEM IND LTD (JP) 1994-11-02 EP disclosed
US-5250669-A Thermostability, photoresists WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-05 US disclosed
EP-0323050-A2 Photosensitive compound WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1989-07-05 EP disclosed