SCHEMBL940482

SCHEMBL940482

O=C(O)c1cccc(-c2cccc(C(=O)O)c2C(F)(F)F)c1C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.48
ALDH1A1 P00352 5/20 0.46
ALOX15 P16050 2/20 0.46
HNF4A P41235 1/20 0.46
MAPT P10636 2/20 0.44
MYC P01106 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
LMNA P02545 1/20 0.44
ALB P02768 1/20 0.44
KDM4E B2RXH2 3/20 0.44
HPGD P15428 3/20 0.44
HDAC8 Q9BY41 1/20 0.43
LIG1 P18858 1/20 0.42
TAS2R14 Q9NYV8 3/20 0.41
TSHR P16473 1/20 0.41
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
FABP4 P15090 1/20 0.41
CA12 O43570 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544646 0.89 ALDH1A1 (0.50) HSD17B10ALDH1A1ALOX15HNF4AMAPT
SCHEMBL28481844 0.89 ALDH1A1 (0.52) HSD17B10ALDH1A1ALOX15MAPTMYC
SCHEMBL2174123 0.89 HNF4A (0.58) HSD17B10ALDH1A1ALOX15HNF4AMAPT
Hydrochloric Acid SCHEMBL29281803 0.82 FOLH1 (0.44) ALDH1A1ALOX15HNF4AMAPTMYC
SCHEMBL28334899 0.82 DDT (0.54) HNF4A
SCHEMBL1163351 0.82 ALDH1A1 (0.54) HSD17B10ALDH1A1ALOX15HNF4AMAPT
SCHEMBL31388520 0.82 ALB (0.57) ALDH1A1ALOX15MAPTALBKDM4E
SCHEMBL1259459 0.82 ALB (0.57) ALDH1A1ALOX15MAPTALBKDM4E
SCHEMBL1195140 0.82 TAS2R14 (0.51) ALDH1A1ALOX15MAPTLMNAALB
SCHEMBL29693889 0.81 NAPRT (0.42) ALDH1A1ALOX15MAPTL3MBTL1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4174108-B1 RESIN PARTICLE, TONER, DEVELOPER, DEVELOPER STORAGE CONTAINER, RESIN PARTICLE PRODUCING METHOD, TONER PRODUCING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH CO LTD (JP) 2024-09-18 EP disclosed
US-20240288789-A1 RESIN PARTICLE, TONER, DEVELOPING AGENT, DEVELOPING AGENT ACCOMMODATING UNIT, METHOD OF MANUFACTURING RESIN PARTICLE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2024-08-29 US disclosed
US-20240228770-A1 RESIN PARTICLES, METHOD FOR PRODUCING RESIN PARTICLES, TONER, DEVELOPER, TONER STORAGE, AND IMAGE FORMING APPARATUS RICOH COMPANY, LTD. (JP) 2024-07-11 US disclosed
US-20230324823-A1 RESIN PARTICLES, TONER, DEVELOPER, TONER HOUSING UNIT, IMAGE FORMING APPARATUS, AND METHOD OF FORMING IMAGE RICOH COMPANY, LTD. (JP) 2023-10-12 US disclosed
US-20230139673-A1 RESIN PARTICLE, TONER, DEVELOPER, DEVELOPER STORAGE CONTAINER, RESIN PARTICLE PRODUCING METHOD, TONER PRODUCING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
EP-4174108-A1 RESIN PARTICLE, TONER, DEVELOPER, DEVELOPER STORAGE CONTAINER, RESIN PARTICLE PRODUCING METHOD, TONER PRODUCING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD Ricoh Company, Ltd. (JP) 2023-05-03 EP disclosed
EP-3418811-B1 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER RICOH CO LTD (JP) 2021-07-28 EP disclosed
US-10429756-B2 Toner, developer, process cartridge, image forming apparatus, image forming method, and method for manufacturing toner RICOH COMPANY, LTD. (JP) 2019-10-01 US disclosed
EP-3418811-A2 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER Ricoh Company, Limited (JP) 2018-12-26 EP disclosed
US-20180364600-A1 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER RICOH COMPANY, LTD. (JP) 2018-12-20 US disclosed
US-20070154843-A1 Resin and resin composition ASAHI KASEI EMD CORPORATION (JP) 2007-07-05 US disclosed
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
EP-1707588-A1 RESIN AND RESIN COMPOSITION Asahi Kasei EMD Corporation (JP) 2006-10-04 EP disclosed
US-20060204882-A1 Toner, toner manufacturing method, developer, image forming apparatus, and process cartridge for the image forming apparatus RICOH COMPANY LIMITED (JP) 2006-09-14 US disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed