SCHEMBL9485089

SCHEMBL9485089

CC(=O)C(C(C)=O)=C(C)C(N)=O

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.44
BLM P54132 2/20 0.44
ALOX15 P16050 1/20 0.44
PMP22 Q01453 1/20 0.44
TDP1 Q9NUW8 2/20 0.42
TSHR P16473 1/20 0.38
THPO P40225 1/20 0.38
LDHA P00338 2/20 0.33
LDHB P07195 1/20 0.33
CRBN Q96SW2 1/20 0.32
CA4 P22748 2/20 0.32
ALDH1A1 P00352 1/20 0.31
OR51E2 Q9H255 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4779556 0.78 LMNA (0.58) LMNABLMALOX15PMP22TDP1
SCHEMBL4141273 0.78 LMNA (0.58) LMNABLMALOX15PMP22TDP1
SCHEMBL27696587 0.78 LMNA (0.58) LMNABLMALOX15PMP22TDP1
SCHEMBL2631747 0.76 LMNA (0.47) LMNABLMALOX15PMP22TDP1
SCHEMBL10499389 0.75 LDHA (0.44) LMNABLMALOX15PMP22TDP1
SCHEMBL10499390 0.75 LDHA (0.44) LMNABLMALOX15PMP22TDP1
SCHEMBL27476647 0.74 LMNA (0.54) LMNABLMALOX15PMP22TDP1
SCHEMBL598557 0.73
SCHEMBL2631150 0.73 LMNA (0.44) LMNABLMALOX15PMP22TDP1
SCHEMBL20438772 0.73 LMNA (0.44) LMNABLMALOX15PMP22TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110462797-B Polishing composition 福吉米株式会社 2023-09-22 CN disclosed
CN-106463386-B Method for polishing silicon wafer, polishing composition, and polishing composition set 福吉米株式会社 2020-12-01 CN disclosed
CN-111433311-A Polishing liquid, polishing liquid set, polishing method, and defect suppression method 日立化成株式会社 2020-07-17 CN disclosed
CN-110998800-A Polishing liquid, polishing liquid set and polishing method 日立化成株式会社 2020-04-10 CN disclosed
EP-0294648-B1 NOVEL COPOLYMER AND WATER- AND OIL-REPELLENT COMPRISING THE SAME DAIKIN INDUSTRIES, LIMITED (JP) 1993-01-07 EP disclosed
US-5055538-A (Meth)Acrylate copolymers with a perfluoroalkylmonomer, stearyl acrylate or methacrylate; antislipping agents; stable dry cleaning and washing agents DAIKIN INDUSTRIES LTD. (JP) 1991-10-08 US disclosed
EP-0294648-A2 Novel copolymer and water- and oil-repellent comprising the same DAIKIN INDUSTRIES, LIMITED (JP) 1988-12-14 EP disclosed