SCHEMBL949663

SCHEMBL949663

CCC(CC(=O)O)OCI

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
CYP1A2 P05177 3/20 0.34
MAPK1 P28482 4/20 0.33
GMNN O75496 3/20 0.33
MAPT P10636 3/20 0.33
NPSR1 Q6W5P4 3/20 0.33
MEN1 O00255 2/20 0.33
HSP90AA1 P07900 2/20 0.33
BLM P54132 2/20 0.33
KMT2A Q03164 2/20 0.33
NR1H4 Q96RI1 2/20 0.33
SLC22A6 Q4U2R8 1/20 0.33
TP53 P04637 1/20 0.33
CYP2C9 P11712 1/20 0.33
TSHR P16473 1/20 0.33
HIF1A Q16665 1/20 0.33
GLA P06280 1/20 0.33
PMP22 Q01453 1/20 0.33
MME P08473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25825 0.82 LMNA (0.38) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL498556 0.78 CYP1A2 (0.38) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL9472174 0.77 LMNA (0.35) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL3043003 0.77 LMNA (0.41) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL2223328 0.75 CYP1A2 (0.42) LMNACYP1A2MAPK1GMNNMAPT
SCHEMBL15199823 0.75 TSHR (0.35) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL25946706 0.75 CYP1A2 (0.42) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL25517 0.75
SCHEMBL28068435 0.75 MMP12 (0.43) LMNASMN1; SMN2CYP1A2MAPK1GMNN
SCHEMBL1118391 0.74 MAPK1 (0.35) LMNASMN1; SMN2MAPK1MMEACE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10106486-B2 Method for producing carboxylic acid esters and the use thereof as plasticizers BASF SE (DE) 2018-10-23 US claimed
US-8709705-B2 Metal-containing compositions and method of making same PRYOG, LLC (US) 2014-04-29 US claimed
EP-4624503-A1 CURABLE POLYURETHANE COMPOSITION WITH ISOCYANURATE SILANES Sika Technology AG (CH) 2025-10-01 EP disclosed
EP-2326744-B1 METAL COMPOSITIONS AND METHODS OF MAKING SAME PRYOG LLC (US) 2022-06-01 EP disclosed
US-20200232928-A1 INDICATOR SYSTEM COVESTRO DEUTSCHLAND AG (DE) 2020-07-23 US disclosed
EP-2796927-B1 Lithographic printing plate precursors EASTMAN KODAK CO (US) 2016-01-13 EP disclosed
EP-2796927-A1 Lithographic printing plate precursors Eastman Kodak Company (US) 2014-10-29 EP disclosed
US-8648157-B2 Metal-containing compositions PRYOG, LLC (US) 2014-02-11 US disclosed
US-20110092653-A1 Metal-Containing Compositions HYBRID PLASTICS, INC. 2011-04-21 US disclosed
US-7888441-B2 Metal-containing compositions PRYOG, LLC (US) 2011-02-15 US disclosed
EP-2270110-A1 PIGMENT-DISPERSED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, COLOR FILTER, LIQUID CRYSTAL DISPLAY ELEMENT, AND SOLID IMAGE PICKUP ELEMENT FUJIFILM Corporation (JP) 2011-01-05 EP disclosed
US-20040034160-A1 Acetal protected polymers and photoresists compositions thereof ARCH SPECIALITY CHEMICALS, INC. 2004-02-19 US disclosed
US-20030204035-A1 Thermally cured underlayer for lithographic application ARCH SPECIALTY CHEMICALS INC. 2003-10-30 US disclosed
US-20030078354-A1 Novel beta-oxo compounds and their use in photoresist ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-24 US disclosed
US-20030065101-A1 Silicon-containing acetal protected polymers and photoresists compositions thereof ARCH SPECIALITY CHEMICALS, INC. 2003-04-03 US disclosed
US-20030064321-A1 Free-acid containing polymers and their use in photoresists ARCH SPECIALTY CHEMICALS, INC. 2003-04-03 US disclosed
US-20030022097-A1 Tertiary-butyl acrylate polymers and their use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC (US) 2003-01-30 US disclosed
US-20020173594-A1 Thermally cured underlayer for lithographic application ARCH SPECIALTY CHEMICALS, INC. (US) 2002-11-21 US disclosed
EP-1152295-A1 Tertiary-butyl acrylate polymers and their use in photoresist compositions Arch Specialty Chemicals, Inc. (US) 2001-11-07 EP disclosed
EP-0138703-A2 Carboxylated cellulose ester EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-04-24 EP disclosed