SCHEMBL9505193

SCHEMBL9505193

CSC(=S)CC1Sc2ccccc2N1C

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ MAPT P10636 3/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ HPGD P15428 1/20 0.33
▸ PPARG P37231 1/20 0.33
▸ NPC1 O15118 2/20 0.33
▸ RAB9A P51151 2/20 0.33
▸ RECQL P46063 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ MAOA P21397 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10358772 0.82 ALDH1A1 (0.35) SMN1; SMN2MAPTALDH1A1HPGDPPARG
SCHEMBL7992802 0.76 MAOA (0.42) SMN1; SMN2MAPTALDH1A1PPARGMEN1
SCHEMBL11515966 0.74 MAOA (0.41) SMN1; SMN2ALDH1A1HPGDPPARGMAOA
SCHEMBL5806333 0.73 MAOA (0.39) SMN1; SMN2ALDH1A1PPARGMEN1KMT2A
SCHEMBL27986763 0.72 MAOA (0.36) SMN1; SMN2ALDH1A1PPARGMEN1KMT2A
SCHEMBL27838672 0.69 MAOA (0.36) SMN1; SMN2ALDH1A1PPARGMEN1KMT2A
SCHEMBL11515393 0.69 MAOA (0.36) SMN1; SMN2ALDH1A1PPARGMEN1KMT2A
SCHEMBL18434891 0.69 MEN1 (0.36) SMN1; SMN2MAPTALDH1A1HPGDPPARG
SCHEMBL30923520 0.67 MAOA (0.41) SMN1; SMN2ALDH1A1RAB9AMEN1KMT2A
SCHEMBL4822999 0.67 MAOA (0.41) SMN1; SMN2ALDH1A1RAB9AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0316240-B1 BILAYERED ANODIZED ALUMINIUM SUPPORT, METHOD FOR THE PREPARATION THEREOF AND LITHOGRAPHIC PRINTING PLATE CONTAINING SAME EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1993-07-28 — — EP disclosed
US-4983497-A Silicate layer contacting layer formed by aqueous zinc acetate bath treatment EASTMAN KODAK COMPANY (US) 1991-01-08 — — US disclosed
EP-0218159-B1 ANODIZED ALUMINUM SUPPORT, METHOD FOR THE PREPARATION THEREOF AND LITHOGRAPHIC PRINTING PLATE CONTAINING SAME EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1990-06-13 — — EP disclosed
EP-0221334-B1 SUBBED LITHOGRAPHIC PRINTING PLATE EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-12-13 — — EP disclosed
EP-0218160-B1 TREATED ANODIZED ALUMINUM SUPPORT AND LITHOGRAPHIC PRINTING PLATE CONTAINING SAME EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-12-06 — — EP disclosed
US-4865951-A ELECTROLYSIS USING PHOSPHORIC ACID EASTMAN KODAK COMPANY (US) 1989-09-12 — — US disclosed
EP-0316240-A1 Bilayered anodized aluminium support, method for the preparation thereof and lithographic printing plate containing same EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-05-17 — — EP disclosed
EP-0221334-A1 Subbed lithographic printing plate EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-05-13 — — EP disclosed
EP-0218160-A1 Treated anodized aluminum support and lithographic printing plate containing same EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-04-15 — — EP disclosed
EP-0218159-A1 Anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-04-15 — — EP disclosed
US-4647346-A IMPROVED ABRASION RESISTANCE EASTMAN KODAK COMPANY (US) 1987-03-03 — — US disclosed
US-4640886-A ANODIZED, SILICATED ALUMINUM SUPPORT, RADIATION SENSITIVE POLYESTER, BENZOIC ACID LAYERS TO IMPROVE INCUBATION STABILITY EASTMAN KODAK COMPANY (US) 1987-02-03 — — US disclosed
US-4152159-A ACRYLIC ESTER POLYMERS EASTMAN KODAK COMPANY (US) 1979-05-01 — — US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 — — US disclosed
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 — — US disclosed
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