Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2C | P18825 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 8/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 6/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.37 |
| ▸ | HTR2A | P28223 | 3/20 | 0.37 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.37 |
| ▸ | HTR1A | P08908 | 1/20 | 0.37 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.37 |
| ▸ | HTR2B | P41595 | 1/20 | 0.37 |
| ▸ | REN | P00797 | 3/20 | 0.33 |
| ▸ | EPHA2 | P29317 | 1/20 | 0.32 |
| ▸ | MKNK1 | Q9BUB5 | 1/20 | 0.32 |
| ▸ | CHEK1 | O14757 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL599223 | 0.94 | ADRA2C (0.41) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL597741 | 0.94 | ADRA2C (0.41) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL8510441 | 0.87 | ADRA2C (0.45) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL6008849 | 0.83 | SLC6A2 (0.41) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL10330624 | 0.80 | SLC6A2 (0.47) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL596661 | 0.78 | SMN1; SMN2 (0.42) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL597657 | 0.78 | SMN1; SMN2 (0.42) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL27767545 | 0.78 | ADRA2C (0.41) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL2893125 | 0.76 | SLC6A2 (0.36) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A | |
| SCHEMBL2892626 | 0.76 | SLC6A2 (0.36) | ADRA2CSLC6A4SLC6A2SLC6A3HTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2100887-B1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| EP-1829850-B1 | Method for the preparation of fluorinated monomers | SHINETSU CHEMICAL CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| US-8062831-B2 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-22 | — | — | US | disclosed |
| US-7871752-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7868199-B2 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | EUDYNA DEVICES INC. (JP) | 2011-01-11 | — | — | US | disclosed |
| EP-2070901-B1 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-7833694-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7771914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7678530-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-16 | — | — | US | disclosed |
| US-20090081588-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20080090172-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| US-20080008961-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070231741-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| EP-1829850-A2 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070160929-A1 | photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. | 2007-07-12 | — | — | US | disclosed |
| US-20060093960-A1 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-05-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | AFF1, FASN, FAR1 | ADRA2C 3374/4885SLC6A4 4651/4885SLC6A2 4649/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.