SCHEMBL9507704

SCHEMBL9507704

CO[Si](CCCS(=O)(=O)Cl)(OC)OC

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4670003 0.86
SCHEMBL5586705 0.78
SCHEMBL6783827 0.77 LMNA (0.34) LMNA
SCHEMBL4309125 0.77 APP (0.41) LMNA
SCHEMBL8727466 0.77 LMNA (0.34) LMNA
SCHEMBL8377195 0.73
SCHEMBL2616658 0.71 APP (0.39) LMNA
SCHEMBL6065851 0.71 ALDH1A1 (0.33) LMNA
SCHEMBL16015210 0.71 RELA (0.36) LMNA
SCHEMBL329127 0.71 LMNA (0.46) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256256-B1 PROCESS FOR THE MANUFACTURE OF LITHOGRAPHIC PRINTING PLATES BASF Aktiengesellschaft (DE) 1993-09-15 EP disclosed
EP-0318820-B1 PROCESS FOR ANODISING SURFACES OF ALUMINIUM OR ALUMINIUM ALLOYS BASF Aktiengesellschaft (DE) 1992-03-18 EP disclosed
US-4939068-A Silane containing acid BASF AKTIENGESELLSCHAFT (DE) 1990-07-03 US disclosed
US-4935332-A Photosensitive element having an aluminum base and silane intermediate layer BASF AKTIENGESELLSCHAFT (DE) 1990-06-19 US disclosed
EP-0329009-A2 Light-sensitive negative registration sheet BASF Aktiengesellschaft (DE) 1989-08-23 EP disclosed
EP-0318820-A2 Process for anodising surfaces of aluminium or aluminium alloys BASF Aktiengesellschaft (DE) 1989-06-07 EP disclosed
US-4782000-A Electrophotographic recording elements with hydrolyzed silane layer BASF AKTIENGESELLSCHAFT (DE) 1988-11-01 US disclosed
EP-0256256-A2 Process for the manufacture of lithographic printing plates BASF Aktiengesellschaft (DE) 1988-02-24 EP disclosed
EP-0256255-A2 Manufacturing process of electrophotographical-recording elements BASF Aktiengesellschaft (DE) 1988-02-24 EP disclosed