SCHEMBL95398

SCHEMBL95398

Brc1cc(Br)c(Oc2nc(Oc3c(Br)cc(Br)cc3Br)nc(Oc3c(Br)cc(Br)cc3Br)n2)c(Br)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.39
ALOX15 P16050 4/20 0.38
ALOX12 P18054 3/20 0.38
TDP1 Q9NUW8 2/20 0.36
TSHR P16473 2/20 0.36
CYP3A4 P08684 1/20 0.36
ALDH1A1 P00352 3/20 0.36
MAPK1 P28482 2/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
AKR1B1 P15121 1/20 0.35
MAPT P10636 2/20 0.33
PRNP P04156 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
RXFP1 Q9HBX9 1/20 0.33
NQO2 P16083 1/20 0.33
KMT2A Q03164 4/20 0.32
HTT P42858 3/20 0.32
MEN1 O00255 3/20 0.32
LMNA P02545 2/20 0.32
HPGD P15428 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13865241 0.89 HSD17B10 (0.38) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL10041849 0.89 HSD17B10 (0.34) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL4315763 0.89 HSP90AA1 (0.38) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL13865237 0.85 HSD17B10 (0.38) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL6822649 0.84 ALOX15 (0.42) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL3803700 0.81 TDP1 (0.45) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL2123860 0.78 ALOX15 (0.34) HSD17B10ALOX15ALOX12TDP1TSHR
SCHEMBL6060636 0.75 HSP90AA1 (0.35) ALDH1A1NQO2KMT2AMEN1LMNA
SCHEMBL13868099 0.74
SCHEMBL13868098 0.72 RAB9A (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 752 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4700087-A1 THERMOPLASTIC FLAME-RETARDANT RESIN COMPOSITION AND MOLDED ARTICLE LG Chem, Ltd. (KR) 2026-02-25 EP claimed
US-12479969-B2 Method for preparing flame retardant aid and flame retardant resin composition comprising flame retardant aid prepared by same LG CHEM, LTD. (KR) 2025-11-25 US claimed
EP-4053202-B1 THERMOPLASTIC RESIN COMPOSITION AND MOLDED PRODUCT MANUFACTURED THEREFROM LOTTE CHEMICAL CORP (KR) 2024-12-04 EP claimed
EP-3907266-B1 FLAME RETARDANT RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME LG CHEMICAL LTD (KR) 2024-11-27 EP claimed
CN-114286843-B Thermoplastic resin composition and molded product made therefrom 乐天化学株式会社 2024-08-09 CN claimed
CN-113423782-B Method for preparing flame retardant auxiliary and flame retardant resin composition comprising the flame retardant auxiliary prepared thereby 株式会社LG化学 2024-07-12 CN claimed
WO-2023056480-A9 TRANSPARENT FIRE-RETARDANT COMPOSITE MATERIAL MADICO, INC. (US) 2024-05-16 WO claimed
CN-117820841-A Production method of flame-retardant polyurethane sieve plate 安徽屹翔滤材有限公司 2024-04-05 CN claimed
CN-115558181-B Flame-retardant master batch and preparation method and application thereof 广东顺德科恩新材料有限公司 2024-03-19 CN claimed
EP-4317312-A1 THERMOPLASTIC RESIN COMPOSITION AND ARTICLE MANUFACTURED USING SAME Lotte Chemical Corporation (KR) 2024-02-07 EP claimed
EP-0735084-B1 Flame retardant thermoplastic styrenic resin composition DAI ICHI KOGYO SEIYAKU CO LTD (JP) 2000-01-12 EP claimed
US-5965731-A Production of tris(2,4,6-tribromophenoxy)-s-1,3,5-triazine ALBEMARLE CORPORATION (US) 1999-10-12 US claimed
EP-0945477-A1 Cyanate ester based thermoset compositions GENERAL ELECTRIC COMPANY (US) 1999-09-29 EP claimed
EP-0735084-A1 Flame retardant thermoplastic styrenic resin composition DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1996-10-02 EP claimed
EP-0303108-B1 Light-sensitive composition, registration material prepared therefrom and process for the production of negative relief images HOECHST AG (DE) 1994-02-23 EP claimed
US-5284604-A Comprising brominated-phenoxytriazines and bis/tetrabromo-phthalimide/ compounds DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1994-02-08 US claimed
US-4990429-A Process for the production of negative relief copies utilizing reversal processing HOECHST AKTIENGESELLSCHAFT (DE) 1991-02-05 US claimed
US-4889788-A Photosensitive composition, photosensitive copying material prepared from this composition with thermal hardening symmetric triazine alkyl(aryl)-ether HOECHST AKTIENGESELLSCHAFT (DE) 1989-12-26 US claimed
EP-0303108-A2 Light-sensitive composition, registration material prepared therefrom and process for the production of negative relief images HOECHST AKTIENGESELLSCHAFT (DE) 1989-02-15 EP claimed
US-4486560-A METAL SALT OF AROMATIC SULFONAMIDE AND ORGANIC HALOGEN COMPOUND THE DOW CHEMICAL COMPANY (US) 1984-12-04 US claimed