SCHEMBL9541163

SCHEMBL9541163

CC(=O)Oc1ccc(C(=O)C(F)(F)F)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.56
HSD17B10 Q99714 1/20 0.55
LMNA P02545 1/20 0.53
MLYCD O95822 7/20 0.51
CES1 P23141 1/20 0.50
KMT2A Q03164 2/20 0.49
MEN1 O00255 1/20 0.49
ESR1 P03372 1/20 0.49
PGR P06401 1/20 0.49
CHRM2 P08172 1/20 0.49
ADORA3 P0DMS8 1/20 0.49
AR P10275 1/20 0.49
CHRM1 P11229 1/20 0.49
SLC6A2 P23975 1/20 0.49
SLC6A3 Q01959 1/20 0.49
MAPT P10636 2/20 0.48
POLB P06746 1/20 0.48
PKM P14618 1/20 0.48
ALDH1A1 P00352 1/20 0.44
HSP90AA1 P07900 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9204751 0.84 ELANE (0.51) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL11815870 0.82 ELANE (0.58) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL23142838 0.81 ELANE (0.56) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL9541096 0.81 ELANE (0.56) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL29177238 0.81 KIF11 (0.56) ELANEMLYCDCES1KMT2AMEN1
SCHEMBL1398393 0.80 CES1 (0.59) LMNAMLYCDCES1KMT2AMEN1
SCHEMBL9339013 0.79 ELANE (0.83) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL30219461 0.79 GAA (0.51) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL269329 0.78 LMNA (0.80) ELANEHSD17B10LMNAKMT2AMEN1
SCHEMBL25846701 0.78 MLYCD (0.57) MLYCDCES1GAAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed
WO-1993014065-A1 PROCESS FOR PREPARING 1,3,5- TRIS(4'-HYDROXYPHENYL)BENZENE AND ITS DERIVATIVES HOECHST CELANESE CORPORATION (US) 1993-07-22 WO disclosed