SCHEMBL955583

SCHEMBL955583

C=CC(=O)OC(C)Oc1ccc(C(C)(C)c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 11/20 0.44
ALDH1A1 P00352 9/20 0.44
SMN1; SMN2 Q16637 4/20 0.44
GAA P10253 3/20 0.44
TDP1 Q9NUW8 1/20 0.43
MEN1 O00255 5/20 0.42
KMT2A Q03164 5/20 0.42
HTT P42858 2/20 0.42
POLB P06746 2/20 0.41
ESR1 P03372 1/20 0.39
CYP3A4 P08684 1/20 0.39
ESR2 Q92731 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
LMNA P02545 2/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
PKM P14618 1/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL137573 0.94 ALDH1A1 (0.37) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL12192011 0.94 KDM4E (0.42) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL5899611 0.90 KMT2A (0.41) KDM4EALDH1A1SMN1; SMN2GAAKMT2A
SCHEMBL21114342 0.90 THRB (0.42) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL5899438 0.89 TAS1R3 (0.40) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL21114313 0.89 ALDH1A1 (0.34) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL5899577 0.88 LMNA (0.48) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL6905540 0.88 ALDH1A1 (0.35) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL5899638 0.87 MAPT (0.38) KDM4EALDH1A1SMN1; SMN2GAATDP1
SCHEMBL34034 0.85 THRB (0.46) ALDH1A1SMN1; SMN2GAATDP1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117203007-A Composition comprising silver nanoplates 巴斯夫欧洲公司 2023-12-08 CN claimed
EP-2042528-B1 Curable resin composition SONY CHEM & INF DEVICE CORP (JP) 2010-06-16 EP claimed
EP-2042528-A1 Curable resin composition Sony Chemical & Information Device Corporation (JP) 2009-04-01 EP claimed
US-7446159-B1 Fluorene group-containing acrylate or methacrylate; viscosity suitable for encapsulating optical devices such as light-emitting devices; cured product has a refractive index greater than or equal to that of epoxy resins, exhibits excellent heat resistance, light resistance, thermal stress relaxation SONY CORPORATION (JP) 2008-11-04 US claimed
CN-122012006-A Ultraviolet curing glue with high adhesion performance and preparation method thereof 浙江至格科技有限公司 2026-05-12 CN disclosed
CN-114829304-B Coated zirconia particles and method for producing same 关东电化工业株式会社 2025-04-15 CN disclosed
CN-119731276-A UV curable coatings with high refractive index 巴斯夫欧洲公司 2025-03-28 CN disclosed
CN-118475655-A ZrO2 dispersion 关东电化工业株式会社 2024-08-09 CN disclosed
EP-4403595-A1 RESIN COMPOSITION FOR JET DISPENSING, ADHESIVE FOR ELECTRONIC COMPONENT, CURED PRODUCTS THEREOF, AND ELECTRONIC COMPONENT Namics Corporation (JP) 2024-07-24 EP disclosed
EP-4403596-A1 RESIN COMPOSITION, ADHESIVE FOR ELECTRONIC COMPONENT, CURED PRODUCTS OF THESE, AND ELECTRONIC COMPONENT Namics Corporation (JP) 2024-07-24 EP disclosed
CN-117321151-A Composition comprising flaky transition metal particles 巴斯夫欧洲公司 2023-12-29 CN disclosed
CN-117203007-A Composition comprising silver nanoplates 巴斯夫欧洲公司 2023-12-08 CN disclosed
EP-1857469-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION TOAGOSEI CO., LTD. (JP) 2007-11-21 EP disclosed
US-20070264464-A1 Optical recording medium-producing sheet and optical recording medium, and methods of producing the same LINTEC CORPORATION (JP) 2007-11-15 US disclosed
EP-1855277-A2 Optical recording medium-producing sheet and optical recording medium and methods of producing the same Lintec Corporation (JP) 2007-11-14 EP disclosed
EP-1308471-B1 Radiation curable resin composition for Fresnel lens and Fresnel lens sheet DAINIPPON INK & CHEMICALS (JP) 2005-12-14 EP disclosed
US-6809889-B2 EPOXY (METH)ACRYLATE; (METH)ACRYLATE OF LOW MOLECULAR WEIGHT POLYOXYPROPYLENE; CYCLIC (METH)ACRYLATE (E.G., PHENOXYETHYL ACRYLATE) AND (METH)ACRYLATE OF TRIS(HYDROXYALKYL) ISOCYANURATE; HIGH ELASTIC MODULUS AND REFRACTIVE INDEX DAINIPPON INK AND CHEMICALS, INC. (JP) 2004-10-26 US disclosed
EP-0759448-B1 Ionizing radiation-curable resin composition for optical article, optical article, and surface light source DAINIPPON PRINTING CO LTD (JP) 2002-01-30 EP disclosed
US-5714218-A AN EPOXYACRYLATE HAVING CYCLIC STRUCTURE CONTAINING ATLEAST TWO ACRYLATE GROUPS AND MONOFUNCTIONAL ACRYLATE HAVING CYCLIC STRUCTURE; HIGH SURFACE HARDNESS, REFRACTIVE INDEX AND FREE FROM DEFORMATION DAINIPPON PRINTING CO., LTD. (JP) 1998-02-03 US disclosed
EP-0759448-A1 Ionizing radiation-curable resin composition for optical article, optical article, and surface light source Dainippon Printing Co., Ltd. (JP) 1997-02-26 EP disclosed