SCHEMBL959624

SCHEMBL959624

C=CC(=O)OC(CC)Oc1ccc(C(C)(C)c2ccc(OC(CC)OC(=O)C=C)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.40
KDM4E B2RXH2 7/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
GAA P10253 2/20 0.39
THRB P10828 2/20 0.39
HTT P42858 4/20 0.38
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
POLB P06746 2/20 0.36
NPC1 O15118 1/20 0.36
MAPT P10636 1/20 0.36
RAB9A P51151 1/20 0.36
AR P10275 2/20 0.36
NR1H4 Q96RI1 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
HIF1A Q16665 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9517525 0.93 ALDH1A1 (0.36) ALDH1A1KDM4ESMN1; SMN2GAATHRB
SCHEMBL7625525 0.92 THRB (0.36) ALDH1A1KDM4ESMN1; SMN2GAATHRB
SCHEMBL14182067 0.85 THRB (0.43) ALDH1A1KDM4ESMN1; SMN2GAATHRB
SCHEMBL14113638 0.85 MAPT (0.43) ALDH1A1KDM4ESMN1; SMN2GAATHRB
SCHEMBL28244460 0.83 THRB (0.48) ALDH1A1KDM4ESMN1; SMN2THRBHTT
SCHEMBL218320 0.82 THRB (0.46) ALDH1A1KDM4ESMN1; SMN2GAATHRB
SCHEMBL957304 0.82 AR (0.39) ALDH1A1KDM4ESMN1; SMN2GAAHTT
SCHEMBL11171980 0.82 KMT2A (0.53) ALDH1A1KDM4ESMN1; SMN2THRBHTT
SCHEMBL27544183 0.82 THRB (0.40) ALDH1A1KDM4ESMN1; SMN2THRBHTT
SCHEMBL11966995 0.82 MAPT (0.42) ALDH1A1SMN1; SMN2GAATHRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110452657-B Solvent-free polyurethane composite adhesive 温州大学新材料与产业技术研究院 2021-10-26 CN claimed
EP-0133357-B1 POLYMER COMPOSITION RAYCHEM LIMITED (GB) 1988-12-07 EP claimed
CN-115838543-B Photopolymer composition and grating containing organosilicon film forming agent 杭州光粒科技有限公司 2024-06-07 CN disclosed
EP-3506394-B1 COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY FUNCTIONAL LAYERS, FUNCTIONAL LAYER FOR NONAQUEOUS SECONDARY BATTERIES, NONAQUEOUS SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES ZEON CORP (JP) 2023-10-11 EP disclosed
CN-115838543-A Photopolymer composition containing organic silicon film forming agent and grating 杭州光粒科技有限公司 2023-03-24 CN disclosed
CN-110452657-B Solvent-free polyurethane composite adhesive 温州大学新材料与产业技术研究院 2021-10-26 CN disclosed
CN-110452657-B Solvent-free polyurethane composite adhesive 温州大学新材料与产业技术研究院 2021-10-26 CN disclosed
US-10930912-B2 Composition for non-aqueous secondary battery functional layer, functional layer for non-aqueous secondary battery, non-aqueous secondary battery, and method of producing electrode for non-aqueous secondary battery ZEON CORPORATION (JP) 2021-02-23 US disclosed
US-20190207189-A1 COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY FUNCTIONAL LAYER, FUNCTIONAL LAYER FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOUS SECONDARY BATTERY, AND METHOD OF PRODUCING ELECTRODE FOR NON-AQUEOUS SECONDARY BATTERY ZEON CORPORATION (JP) 2019-07-04 US disclosed
EP-3506394-A1 COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY FUNCTIONAL LAYERS, FUNCTIONAL LAYER FOR NONAQUEOUS SECONDARY BATTERIES, NONAQUEOUS SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES Zeon Corporation (JP) 2019-07-03 EP disclosed
US-9050774-B2 Antistatic laminate, optical film, polarizing plate, and image display device FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
EP-0409555-B1 Heat-sensitive transfer recording medium of the sublimation type MITSUBISHI RAYON CO (JP) 1995-05-10 EP disclosed
EP-0382454-B1 High solids coating composition, and coated articles and coating process using the same NIPPON OILS & FATS CO LTD (JP) 1994-06-08 EP disclosed
EP-0261505-B1 Composition easily dyeable with sublimable disperse dye MITSUBISHI RAYON CO (JP) 1994-01-26 EP disclosed
EP-0544052-A1 Use of a photocurable resin composition for the preparation of a laminated film. DAICEL-UCB CO., LTD. (JP) 1993-06-02 EP disclosed
US-5096877-A Polyester film adhered to one surface of paper; dye receiving layer cured on film; wrinkle resistance MITSUBISHI RAYON CO., LTD. (JP) 1992-03-17 US disclosed
EP-0409555-A2 Heat-sensitive transfer recording medium of the sublimation type MITSUBISHI RAYON CO., LTD. (JP) 1991-01-23 EP disclosed
US-4937161-A INITIATOR COMBINATION OF ORGANIC BORON COMPOUND ANION SALT OF ORGANIC CATIONIC DYE AND TRIAZINE DERIVATIVE FUJI PHOTO FILM CO., LTD. (JP) 1990-06-26 US disclosed
US-4877922-A POLYESTER, RADIATION CURABLE CROSSLINKING AGENT, SURFACTANT MITSUBISHI RAYON COMPANY, LTD. (JP) 1989-10-31 US disclosed
EP-0102830-B1 DELUSTERING COATING COMPOSITION EXCELLENT IN ABRASION RESISTANCE MITSUBISHI RAYON CO., LTD. (JP) 1987-05-27 EP disclosed