SCHEMBL960158

SCHEMBL960158

CCOC(=O)CC[Si](OC)(OC)OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.47
GAA P10253 2/20 0.46
MGAM O43451 1/20 0.46
SI P14410 1/20 0.46
MGAM2 Q2M2H8 1/20 0.46
ALDH1A1 P00352 5/20 0.43
TRPA1 O75762 1/20 0.43
CYP4F2 P78329 2/20 0.39
CYP4A11 Q02928 2/20 0.39
NR1I2 O75469 1/20 0.38
PGR P06401 1/20 0.38
ADORA3 P0DMS8 1/20 0.38
PTGS2 P35354 1/20 0.38
PDE4D Q08499 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
LMNA P02545 2/20 0.37
HSD17B10 Q99714 1/20 0.37
POLB P06746 2/20 0.37
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27628460 0.88 CYP1A2 (0.53) CYP1A2GAAMGAMSIMGAM2
SCHEMBL26616563 0.83 DGKA (0.44) ALDH1A1L3MBTL1
SCHEMBL3682278 0.83 CYP1A2 (0.47) CYP1A2GAAMGAMSIMGAM2
Succinic Acid Diethyl Ester SCHEMBL17783730 0.81 CYP1A2 (0.61) CYP1A2GAAMGAMSIMGAM2
SCHEMBL4181102 0.81 TSHR (0.42) CYP1A2GAAMGAMSIMGAM2
SCHEMBL26454470 0.80 CYP1A2 (0.48) CYP1A2GAAMGAMSIMGAM2
SCHEMBL31368202 0.79 ALDH1A1 (0.46) ALDH1A1TSHR
SCHEMBL121146 0.79 TSHR (0.57) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL3910536 0.79 GAA (0.52) CYP1A2GAAMGAMSIMGAM2
SCHEMBL14201372 0.79 DGKA (0.39) GAAALDH1A1SMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230340266-A1 SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE JSR CORPORATION (JP) 2023-10-26 US disclosed
US-11492490-B2 Silicone rubber composition and composite obtained using the same DOW TORAY CO., LTD. (JP) 2022-11-08 US disclosed
CN-111417687-B Silicone rubber composition and composite material obtained using the same 陶氏东丽株式会社 2022-06-03 CN disclosed
US-20210054199-A1 SILICONE RUBBER COMPOSITION AND COMPOSITE OBTAINED USING THE SAME DOW TORAY CO., LTD. (JP) 2021-02-25 US disclosed
EP-3733780-A1 SILICONE RUBBER COMPOSITION AND COMPOSITE OBTAINED USING SAME Dow Toray Co., Ltd. (JP) 2020-11-04 EP disclosed
CN-111417687-A Silicone rubber composition and composite material obtained using the same 陶氏东丽株式会社 2020-07-14 CN disclosed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
CN-103172655-A Organosiloxane containing acid anhydride group and method for preparing the same SHINETSU CHEMICAL CO 2013-06-26 CN disclosed
CN-103131011-A Organosiloxane containing anhydride groups and manufacturing method thereof SHINETSU CHEMICAL CO 2013-06-05 CN disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed