Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL106840 | 0.98 | ALDH1A1 (0.35) | ALDH1A1EPHX1 | |
| SCHEMBL16807394 | 0.96 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL674286 | 0.92 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL15472998 | 0.87 | EPHX1 (0.36) | ALDH1A1EPHX1 | |
| SCHEMBL2735083 | 0.85 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL18776052 | 0.85 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL12098115 | 0.85 | ALDH1A1 (0.37) | ALDH1A1TSHREPHX1 | |
| SCHEMBL22103862 | 0.84 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL2510208 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL677915 | 0.83 | ALDH1A1 (0.35) | ALDH1A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112980543-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-19 | — | — | CN | disclosed |
| CN-112980549-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-15 | — | — | CN | disclosed |
| EP-3839018-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-10-18 | — | — | EP | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-3839019-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-08-02 | — | — | EP | disclosed |
| US-11685874-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2023-06-27 | — | — | US | disclosed |
| US-11384311-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-07-12 | — | — | US | disclosed |
| US-11365273-B2 | High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-06-21 | — | — | US | disclosed |
| US-20220169947-A1 | High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same | INFINEUM INTERNATIONAL LIMITED (GB) | 2022-06-02 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-7955780-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-7955780-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20100203451-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100203451-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7648817-B2 | Resin decomposition by acid; increase solubility of alkaline developer | FUJIFILM CORPORATION (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7648817-B2 | Resin decomposition by acid; increase solubility of alkaline developer | FUJIFILM CORPORATION (JP) | 2010-01-19 | — | — | US | disclosed |
| US-20080206669-A1 | POSITIVE WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206669-A1 | POSITIVE WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |