Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 4/20 | 0.33 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9610296 | 0.98 | ALDH1A1 (0.37) | ALDH1A1EPHX1 | |
| SCHEMBL16807394 | 0.94 | ALDH1A1 (0.37) | ALDH1A1 | |
| SCHEMBL674286 | 0.90 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL15472998 | 0.85 | EPHX1 (0.36) | ALDH1A1EPHX1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL677915 | 0.85 | ALDH1A1 (0.35) | ALDH1A1EPHX1SSTR4GAAMEN1 | |
| SCHEMBL13588093 | 0.85 | EPHX1 (0.34) | ALDH1A1EPHX1SSTR4GAAMEN1 | |
| SCHEMBL17247228 | 0.85 | ALDH1A1 (0.36) | ALDH1A1EPHX1 | |
| SCHEMBL2735083 | 0.84 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL18776052 | 0.84 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL7636490 | 0.83 | ALDH1A1 (0.37) | ALDH1A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 544 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-111471366-B | Solvent type high-temperature-resistant non-silicon release agent and preparation method thereof | 广州市梅古化工有限公司 | 2021-07-27 | — | — | CN | claimed |
| CN-111471366-A | Solvent type high-temperature-resistant non-silicon release agent and preparation method thereof | 广州市梅古化工有限公司 | 2020-07-31 | — | — | CN | claimed |
| US-12461443-B2 | Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern | DAICEL CORPORATION (JP) | 2025-11-04 | — | — | US | disclosed |
| EP-4588988-A1 | REACTIVE ADHESIVE TAPE, REACTIVE ADHESIVE TAPE SYSTEM, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| EP-4588985-A1 | REACTIVE ADHESIVE TAPE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| WO-2025132699-A1 | METHOD FOR PRODUCING A MULTI-PHASE POLYMER SYSTEM | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025132698-A1 | METHOD FOR PRODUCING A MULTI-PHASE POLYMER SYSTEM | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025132700-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| EP-4560309-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | National Institute for Materials Science (JP) | 2025-05-28 | — | — | EP | disclosed |
| WO-2025061749-A1 | FLAME-RETARDANT ADHESIVE COMPOSITION | TESA SE (DE) | 2025-03-27 | — | — | WO | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| EP-1755000-A2 | Positive resist composition and a pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-20 | — | — | US | disclosed |
| CN-1708728-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-12-14 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | HCAR1, HCAR2, RARA | ALDH1A1 20/4885EPHX1 44/4885SSTR4 4241/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.