Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15472998 | 0.94 | EPHX1 (0.36) | ALDH1A1 | |
| SCHEMBL2735083 | 0.93 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL18776052 | 0.93 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL9610296 | 0.92 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL16807394 | 0.92 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL106840 | 0.90 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL22103862 | 0.87 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL23964605 | 0.86 | EPHX2 (0.33) | ALDH1A1TSHR | |
| SCHEMBL7664693 | 0.86 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL22103854 | 0.82 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116893576-A | Positive resist material and pattern forming method | 信越化学工业株式会社 | 2023-10-17 | — | — | CN | disclosed |
| US-20230314944-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11709427-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11500289-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-11-15 | — | — | US | disclosed |
| US-20210247694-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-08-12 | — | — | US | disclosed |
| US-20200192221-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-10303056-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-05-28 | — | — | US | disclosed |
| US-9862695-B2 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | DAICEL CORPORATION (JP) | 2018-01-09 | — | — | US | disclosed |
| US-20180004087-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-04 | — | — | US | disclosed |
| US-9335632-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-10 | — | — | US | disclosed |
| EP-2204416-A1 | RESIN COMPOSITION FOR BALLOON AND BALLOON MADE OF THE SAME | Kaneka Corporation (JP) | 2010-07-07 | — | — | EP | disclosed |
| US-20090187162-A1 | Catheter Tube and Catheter Comprising the Tube | KANEKA CORPORATION (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090087607-A1 | Resin Composition for Tubes and Tube | KANEKA CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-2022512-A1 | CATHETER TUBE AND CATHETER COMPRISING THE TUBE | Kaneka Corporation (JP) | 2009-02-11 | — | — | EP | disclosed |
| EP-1832792-A1 | RESIN COMPOSITION FOR TUBES AND TUBE | Kaneka Corporation (JP) | 2007-09-12 | — | — | EP | disclosed |
| EP-0888880-B1 | CONDUCTIVE MULTILAYER BLOW MOLDING AND CONDUCTIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-6723400-B1 | ELECTROCONDUCTIVE, MULTILAYERED HOLLOW MOLDINGS WITH GOOD, WELL-BALANCED HEAT RESISTANCE, HOT WATER RESISTANCE, CHEMICAL RESISTANCE, GASOHOL PERMEATION RESISTANCE, OUTWARD APPEARANCE, INTERLAYER ADHESION AND LOW-TEMP. STIFFNESS | TORAY INDUSTRIES, INC. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-6562779-B2 | Waxes; copolymerization with one or more alkenecarboxylic acids or tertiary ester or mixtures; viscosity without degradation or crosslinking; floor, car, leather, stone cleaners; coating for wood, metal, paper, glass, plastic | BASF AKTIENGESELLSCHAFT (DE) | 2003-05-13 | — | — | US | disclosed |
| US-20010025021-A1 | Preparation of emulsifiable ethylene polymers | BASF AKTIENGESELLSCHAFT (DE) | 2001-09-27 | — | — | US | disclosed |
| EP-0888880-A1 | CONDUCTIVE MULTILAYER BLOW MOLDING AND CONDUCTIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 1999-01-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11709427-B2 | Positive resist composition and pattern forming process | EWSR1, PARG, VIM | ALDH1A1 3639/4885TSHR 4671/4885THRB 4378/4885 |
| US-10303056-B2 | Resist composition and patterning process | VCL, SLC11A2, CD44 | ALDH1A1 2669/4885TSHR 563/4885THRB 237/4885 |
| US-20210247694-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | EWSR1, PARG, VIM | ALDH1A1 3639/4885TSHR 4671/4885THRB 4378/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.