SCHEMBL16807394

SCHEMBL16807394

C=C(C)C(=O)OC(C)(C)C1CCC1

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610296 0.96 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL106840 0.94 ALDH1A1 (0.35) ALDH1A1
SCHEMBL674286 0.92 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL15472998 0.87 EPHX1 (0.36) ALDH1A1
SCHEMBL2510208 0.87 ALDH1A1 (0.31) ALDH1A1
SCHEMBL2735083 0.85 ALDH1A1 (0.34) ALDH1A1
SCHEMBL18776052 0.85 ALDH1A1 (0.34) ALDH1A1
SCHEMBL22103862 0.84 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL23964605 0.82 EPHX2 (0.33) ALDH1A1TSHR
SCHEMBL7664693 0.82 ALDH1A1 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9261785-B2 Polymer compound, resin composition for photoresists, and method for producing semiconductor DAICEL CORPORATION (JP) 2016-02-16 US disclosed
US-9261785-B2 Polymer compound, resin composition for photoresists, and method for producing semiconductor DAICEL CORPORATION (JP) 2016-02-16 US disclosed
US-20150168831-A1 POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR DAICEL CORPORATION (JP) 2015-06-18 US disclosed
US-20150168831-A1 POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR DAICEL CORPORATION (JP) 2015-06-18 US disclosed