Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.34 |
| ▸ | HTR1A | P08908 | 1/20 | 0.34 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.34 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.34 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2303044 | 0.80 | ALDH1A1 (0.42) | ALDH1A1HSD17B10LMNACHRM5CHRM1 | |
| SCHEMBL2698892 | 0.78 | ALOX15 (0.44) | HSD17B10LMNACHRM5CHRM1CHRM3 | |
| SCHEMBL419021 | 0.77 | ALDH1A1 (0.43) | ALDH1A1HSD17B10LMNACHRM5CHRM1 | |
| SCHEMBL3957027 | 0.76 | HCAR2 (0.40) | RAB9A | |
| SCHEMBL1473802 | 0.76 | ALDH1A1 (0.43) | ALDH1A1HSD17B10LMNACHRM5CHRM1 | |
| SCHEMBL960528 | 0.76 | ALDH1A1 (0.50) | ALDH1A1HSD17B10LMNACHRM5CHRM1 | |
| SCHEMBL2528318 | 0.76 | — | — | |
| SCHEMBL8422452 | 0.76 | — | — | |
| SCHEMBL334697 | 0.75 | — | — | |
| SCHEMBL28137287 | 0.75 | PRKCA (0.37) | GAARAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| CN-107209303-B | Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window | 富士胶片株式会社 | 2020-07-14 | — | — | CN | disclosed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| CN-107735470-A | Adiabatic coating | 富士胶片株式会社 | 2018-02-23 | — | — | CN | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| CN-103597550-B | Electroconductive member, the manufacture method of electroconductive member, constituent, touch-screen and solar cell | 富士胶片株式会社 | 2017-06-30 | — | — | CN | disclosed |
| US-9633755-B2 | Conductive composition, conductive member, conductive member production method, touch panel, and solar cell | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| CN-102762579-A | Method for producing ester-functional silanes | WACKER CHEMIE AG | 2012-10-31 | — | — | CN | disclosed |
| WO-2011117071-A1 | SILAOXACYCLEN | WACKER CHEMIE AG (DE) | 2011-09-29 | — | — | WO | disclosed |
| WO-2011101278-A1 | METHOD FOR PRODUCING ESTER-FUNCTIONAL SILANES | WACKER CHEMIE AG (DE) | 2011-08-25 | — | — | WO | disclosed |
| US-20110000658-A1 | HYDROPHILIC MEMBER | FUJIFILM CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2239137-A1 | HYDROPHILIC MEMBERS | FUJIFILM Corporation (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101133364-A | Composition for resist underlayer film and method for producing same | JSR CORP (JP) | 2008-02-27 | — | — | CN | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |