Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | AHR | P35869 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10969574 | 0.80 | CYP3A4 (0.41) | CYP3A4MAPK1 | |
| SCHEMBL7548155 | 0.78 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL9321423 | 0.76 | CYP3A4 (0.53) | LMNAESR1HTTCYP3A4MAPK1 | |
| SCHEMBL29700366 | 0.74 | TP53 (0.50) | LMNATP53HTTCYP3A4MAPK1 | |
| SCHEMBL7560420 | 0.74 | TP53 (0.58) | LMNATP53HTTCYP3A4GAA | |
| SCHEMBL29700271 | 0.74 | TP53 (0.58) | LMNATP53HTTCYP3A4GAA | |
| SCHEMBL9265249 | 0.72 | — | — | |
| SCHEMBL11600496 | 0.70 | TSHR (0.38) | CYP3A4MAPK1AHR | |
| SCHEMBL8728798 | 0.70 | — | — | |
| SCHEMBL28773655 | 0.70 | IDO1 (0.38) | LMNAESR1TP53HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0002805-B1 | PHOTOPOLYMERIZABLE COATING AND REGISTRATION MATERIALS,SUCH AS TRANSFER FOILS WITH A PHOTOSENSIBLE COATING AND PHOTORESIST MATERIALS, CONTAINING A PHOTOINITIATOR AND AN ORGANIC HALOGEN COMPOUND | BASF Aktiengesellschaft (DE) | 1981-01-07 | — | — | EP | claimed |
| US-4239609-A | PHOTORESISTS, RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1980-12-16 | — | — | US | claimed |
| EP-0002805-A1 | Photopolymerizable coating and registration materials,such as transfer foils with a photosensible coating and photoresist materials, containing a photoinitiator and an organic halogen compound | BASF Aktiengesellschaft (DE) | 1979-07-11 | — | — | EP | claimed |
| EP-0291881-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0291878-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-11 | — | — | EP | disclosed |
| EP-0291879-B1 | PHOTOPOLYMERISABLE RECORDING MATERIALS AS WELL AS PHOTORESIST LAYERS AND PLANOGRAPHIC PRINTING PLATES ON A BASIS OF THESE RECORDING MATERIALS AS WELL AS QUINAZOLONE-4 COMPOUNDS | BASF Aktiengesellschaft (DE) | 1990-11-07 | — | — | EP | disclosed |
| US-4962011-A | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-10-09 | — | — | US | disclosed |
| EP-0373436-A2 | Light-sensitive registration material | BASF Aktiengesellschaft (DE) | 1990-06-20 | — | — | EP | disclosed |
| US-4908448-A | 4-Quinazolone compounds | BASF AKTIENGESELLSCHAFT (DE) | 1990-03-13 | — | — | US | disclosed |
| US-4891301-A | AS SENSITIZERS | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-02 | — | — | US | disclosed |
| US-4886735-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1989-12-12 | — | — | US | disclosed |
| US-4725524-A | Dry film resist and production of resist images | BASF AKTIENGESELLSCHAFT (DE) | 1988-02-16 | — | — | US | disclosed |
| EP-0249857-A2 | Photosensitive registration element | BASF Aktiengesellschaft (DE) | 1987-12-23 | — | — | EP | disclosed |
| US-4632897-A | Photopolymerizable recording material suitable for the production of photoresist layers | BASF AKTIENGESELLSCHAFT (DE) | 1986-12-30 | — | — | US | disclosed |
| EP-0186091-A1 | Dry resist film and process for producing resist patterns | BASF Aktiengesellschaft (DE) | 1986-07-02 | — | — | EP | disclosed |
| EP-0002805-B1 | PHOTOPOLYMERIZABLE COATING AND REGISTRATION MATERIALS,SUCH AS TRANSFER FOILS WITH A PHOTOSENSIBLE COATING AND PHOTORESIST MATERIALS, CONTAINING A PHOTOINITIATOR AND AN ORGANIC HALOGEN COMPOUND | BASF Aktiengesellschaft (DE) | 1981-01-07 | — | — | EP | disclosed |
| US-4239609-A | PHOTORESISTS, RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1980-12-16 | — | — | US | disclosed |
| US-4239609-A | PHOTORESISTS, RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1980-12-16 | — | — | US | disclosed |
| EP-0002805-A1 | Photopolymerizable coating and registration materials,such as transfer foils with a photosensible coating and photoresist materials, containing a photoinitiator and an organic halogen compound | BASF Aktiengesellschaft (DE) | 1979-07-11 | — | — | EP | disclosed |
| EP-0002805-A1 | Photopolymerizable coating and registration materials,such as transfer foils with a photosensible coating and photoresist materials, containing a photoinitiator and an organic halogen compound | BASF Aktiengesellschaft (DE) | 1979-07-11 | — | — | EP | disclosed |