SCHEMBL9625468

SCHEMBL9625468

COc1cccc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.52
MAPT P10636 5/20 0.52
NPC1 O15118 4/20 0.52
GAA P10253 3/20 0.52
MAPK1 P28482 2/20 0.52
RAB9A P51151 1/20 0.52
ABL1 P00519 1/20 0.50
ABCB1 P08183 1/20 0.50
BCR P11274 1/20 0.50
ECE2 P0DPD6 1/20 0.50
TLR2 O60603 1/20 0.48
ERN1 O75460 1/20 0.48
TLR1 Q15399 1/20 0.48
TLR6 Q9Y2C9 1/20 0.48
TXNRD1 Q16881 1/20 0.45
TXNRD3 Q86VQ6 1/20 0.45
TXNRD2 Q9NNW7 1/20 0.45
CA12 O43570 1/20 0.43
AR P10275 1/20 0.43
BCHE P06276 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29402166 0.86 NFE2L2 (0.50) KDM4EMAPTNPC1RAB9AABL1
SCHEMBL147047 0.86 NFE2L2 (0.50) KDM4EMAPTNPC1RAB9AABL1
SCHEMBL147046 0.86 NFE2L2 (0.50) KDM4EMAPTNPC1RAB9AABL1
SCHEMBL9625984 0.81 MAPT (0.40) KDM4EMAPTNPC1GAAMAPK1
SCHEMBL25801382 0.78 NFE2L2 (0.45) KDM4EMAPTNPC1RAB9AABL1
SCHEMBL153283 0.78 DHFR (0.50) KDM4EMAPTNPC1GAARAB9A
SCHEMBL8576000 0.76 HRH4 (0.34) KDM4EMAPTNPC1RAB9AAR
SCHEMBL1426703 0.76 HMGCR (0.47) KDM4EMAPTTP53TSHRALDH1A1
SCHEMBL1426704 0.76 HMGCR (0.47) KDM4EMAPTTP53TSHRALDH1A1
SCHEMBL8570242 0.74 KMT2A (0.45) KDM4EMAPTNPC1MAPK1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0234570-B1 PHOTOPOLYMERIZABLE COMPOSITION, PHOTOSENSITIVE ELEMENT WITH THAT COMPOSITION, AND PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE USING THIS ELEMENT BASF Aktiengesellschaft (DE) 1992-04-22 EP disclosed
US-4935330-A Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element BASF AKTIENGESELLSCHAFT (DE) 1990-06-19 US disclosed