SCHEMBL9629232

SCHEMBL9629232

O=C(O)C#Cc1ccc(C#CC(=O)O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 10/20 0.50
GABRP O00591 1/20 0.47
GABRD O14764 1/20 0.47
GABRA1 P14867 1/20 0.47
GABRB1 P18505 1/20 0.47
GABRG2 P18507 1/20 0.47
GABRB3 P28472 1/20 0.47
GABRA5 P31644 1/20 0.47
GABRA3 P34903 1/20 0.47
GABRA2 P47869 1/20 0.47
GABRB2 P47870 1/20 0.47
GABRA4 P48169 1/20 0.47
GABRE P78334 1/20 0.47
GABRA6 Q16445 1/20 0.47
GABRG1 Q8N1C3 1/20 0.47
GABRG3 Q99928 1/20 0.47
GABRQ Q9UN88 1/20 0.47
NPSR1 Q6W5P4 1/20 0.46
VCP P55072 1/20 0.42
FFAR4 Q5NUL3 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6653836 0.90 APP (0.53) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL68968 0.89 NPSR1 (0.59) FFAR1NPSR1VCPFFAR4RAB9A
Benzene SCHEMBL28174766 0.89 NPSR1 (0.59) FFAR1NPSR1VCPFFAR4RAB9A
SCHEMBL8601155 0.88 APP (0.56) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL7118049 0.88 GSK3B (0.48) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL670335 0.88 VCP (0.58) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL3151444 0.88 FFAR1 (0.52) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL4149218 0.88 FFAR1 (0.44) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL2636129 0.88 TSHR (0.44) FFAR1GABRPGABRDGABRA1GABRB1
SCHEMBL4970860 0.88 RARB (0.55) FFAR1GABRPGABRDGABRA1GABRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-H691-H CONTAINING IMIDOTHIOESTER COMPOUND AND BASE PRECURSOR; HEAT RESISTANCE, STABILITY, ANTIFOGGING AGENT FUJI PHOTO FILM CO., LTD. (JP) 1989-10-03 US claimed
CN-108424367-B Method for preparing propiolic acid and derivatives thereof under mild condition 中国科学院化学研究所 2020-08-18 CN disclosed
US-5166040-A Light sensitive silver halide emulsions for images FUJI PHOTO FILM CO., LTD. (JP) 1992-11-24 US disclosed
EP-0192272-B1 COLOR LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1992-05-27 EP disclosed
US-4957848-A COMPOUND TO REACT WITH OXIDIZED DYE DEVELOPER TO RENDER NONDIFFUSIBLE, LOW MINIMUM DENSITY FUJI PHOTO FILM CO., LTD. (JP) 1990-09-18 US disclosed
EP-0143424-B1 HEAT-DEVELOPABLE LIGHT-SENSITIVE MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 1990-06-27 EP disclosed
US-H691-H CONTAINING IMIDOTHIOESTER COMPOUND AND BASE PRECURSOR; HEAT RESISTANCE, STABILITY, ANTIFOGGING AGENT FUJI PHOTO FILM CO., LTD. (JP) 1989-10-03 US disclosed
EP-0200011-B1 HEAT-DEVELOPABLE LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1989-09-13 EP disclosed
EP-0198356-B1 HEAT DEVELOPABLE LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1989-07-26 EP disclosed
US-4775613-A CONTAINING ACETYLENE SILVER COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1988-10-04 US disclosed
US-4713316-A INFRARED SENSITIZING DYES, MOBILE DYE PRECURSORS, ALKALI, SILVER HALIDE EMULSION FUJI PHOTO FILM CO., LTD. (JP) 1987-12-15 US disclosed
EP-0174634-B1 IMAGE FORMING METHOD FUJI PHOTO FILM CO., LTD. (JP) 1987-12-09 EP disclosed
US-4637975-A CATIONIC DYE FUJI PHOTO FILM CO., LTD. (JP) 1987-01-20 US disclosed
US-4629676-A DRY PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 1986-12-16 US disclosed
EP-0200011-A1 Heat-developable light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1986-11-05 EP disclosed
EP-0198356-A1 Heat developable light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1986-10-22 EP disclosed
EP-0192272-A2 Color light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1986-08-27 EP disclosed
US-4603103-A THERMALLY DECOMPOSABLE ORGANIC SILVER SALT ON A SUPPORT FUJI PHOTO FILM CO., LTD. (JP) 1986-07-29 US disclosed
EP-0174634-A2 Image forming method FUJI PHOTO FILM CO., LTD. (JP) 1986-03-19 EP disclosed
EP-0143424-A2 Heat-developable light-sensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1985-06-05 EP disclosed