SCHEMBL9648251

SCHEMBL9648251

COC(=O)c1ccc(N)cc1C(=O)O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 7/20 0.66
ALDH1A1 P00352 8/20 0.61
MAPT P10636 8/20 0.53
KDM4E B2RXH2 7/20 0.53
HSD17B10 Q99714 4/20 0.53
HPGD P15428 4/20 0.53
MEN1 O00255 4/20 0.53
KMT2A Q03164 4/20 0.53
TDP1 Q9NUW8 3/20 0.53
CYP3A4 P08684 3/20 0.53
THRB P10828 2/20 0.53
RECQL P46063 2/20 0.53
CASP1 P29466 2/20 0.53
CASP7 P55210 2/20 0.53
ALOX15 P16050 2/20 0.53
KDR P35968 2/20 0.53
USP2 O75604 1/20 0.53
POLB P06746 1/20 0.53
PKM P14618 1/20 0.53
APEX1 P27695 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1403643 0.90 GAA (0.72) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL7623605 0.89 GAA (0.70) GAAALDH1A1MAPTKDM4EHSD17B10
Dimethyl Phthalate SCHEMBL28028655 0.85 GAA (0.66) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL29922154 0.85 GAA (0.66) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL9398149 0.85 GAA (0.66) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL6451827 0.85 KDM4E (0.57) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL231377 0.82 ALDH1A1 (0.68) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL29364937 0.82 ALDH1A1 (0.68) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL2926607 0.81 GAA (0.70) GAAALDH1A1MAPTKDM4EHSD17B10
SCHEMBL9705197 0.81 GAA (0.65) GAAALDH1A1MAPTKDM4EHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP disclosed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US disclosed
EP-0255037-A2 A method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-02-03 EP disclosed