Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCL1 | Q07820 | 1/20 | 0.49 |
| ▸ | ESR1 | P03372 | 2/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.48 |
| ▸ | ERN1 | O75460 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | TRPV1 | Q8NER1 | 4/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.42 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.42 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.42 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.42 |
| ▸ | HTR5A | P47898 | 1/20 | 0.41 |
| ▸ | NQO2 | P16083 | 1/20 | 0.41 |
| ▸ | CLK1 | P49759 | 1/20 | 0.41 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19066454 | 0.87 | ESR1 (0.41) | MCL1ESR1ESR2ERN1TRPV1 | |
| SCHEMBL29956684 | 0.85 | ERN1 (0.44) | ESR1ESR2ERN1CYP1A2TRIM24 | |
| SCHEMBL3067367 | 0.85 | ERN1 (0.44) | ESR1ESR2ERN1CYP1A2TRIM24 | |
| SCHEMBL1506773 | 0.81 | MCL1 (0.49) | MCL1ESR1ESR2CYP1A2TRPV1 | |
| SCHEMBL28034950 | 0.81 | MCL1 (0.53) | MCL1ESR1ESR2CYP1A2TRPV1 | |
| SCHEMBL28189143 | 0.81 | CYP1A2 (0.46) | ESR1ESR2ERN1CYP1A2TRPV1 | |
| SCHEMBL9883875 | 0.78 | KIF11 (0.42) | ERN1PTPN1KDM4EMEN1RAB9A | |
| SCHEMBL11903615 | 0.78 | ERN1 (0.50) | ESR1ESR2ERN1TRIM24TRIM33 | |
| SCHEMBL9485988 | 0.78 | CYP2A6 (0.49) | ERN1CYP1A2PTPN1TRIM24TRIM33 | |
| SCHEMBL31661013 | 0.78 | CYP2A6 (0.49) | ERN1CYP1A2PTPN1TRIM24TRIM33 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250229262-A1 | CHIRAL SPIROCYCLIC COMPOUNDS AND METHODS OF PREPARATION AND USE THEREOF | SPHENOTECH CO., LIMITED (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20230043159-A1 | MATRIPTASE 2 INHIBITORS AND USES THEREOF | DISC MEDICINE, INC. | 2023-02-09 | — | — | US | disclosed |
| US-20220340893-A1 | BI-FUNCTIONAL COMPLEXES AND METHODS FOR MAKING AND USING SUCH COMPLEXES | NUEVOLUTION A/S (DK) | 2022-10-27 | — | — | US | disclosed |
| CN-113527066-A | Chiral spiro compound and preparation method and application thereof | 香港科技大学深圳研究院 | 2021-10-22 | — | — | CN | disclosed |
| EP-2879673-B1 | 1,5,6-substituted naphthalene derivatives as sphingosine 1 phosphate (S1P) receptor and/or autotaxin (ATX) modulators for treating inflammatory and autoimmune disorders | BIOGEN MA INC (US) | 2018-07-25 | — | — | EP | disclosed |
| EP-2476713-B1 | Resist underlayer film composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2018-04-11 | — | — | EP | disclosed |
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| WO-2015082848-A2 | NOVEL METHOD FOR THE SYNTHESIS OF 7-METHOXY-NAPHTHALENE-1-CARBALDEHYDE AND USE THEREOF IN THE SYNTHESIS OF AGOMELATINE | LES LABORATOIRES SERVIER (FR) | 2015-06-11 | — | — | WO | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140335692-A1 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20120184103-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120184103-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-2476713-A1 | Resist underlayer film composition and patterning process using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-5155113-A | Administering 5-fluorouracil and derivatives with pyridine and pyridone derivatives | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1992-10-13 | — | — | US | disclosed |
| EP-0180188-B1 | A COMPOSITION FOR INCREASING THE ANTI-CANCER ACTIVITY OF AN ANTI-CANCER COMPOUND | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1992-04-15 | — | — | EP | disclosed |
| EP-0180188-A2 | A composition for increasing the anti-cancer activity of an anti-cancer compound | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1986-05-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230043159-A1 | MATRIPTASE 2 INHIBITORS AND USES THEREOF | MMP7, MATR3, SPINT2 | MCL1 3593/4885ESR1 4245/4885ESR2 3024/4885 |
| US-20250229262-A1 | CHIRAL SPIROCYCLIC COMPOUNDS AND METHODS OF PREPARATION AND USE THEREOF | PKD1, PKD2, SYMPK | MCL1 4006/4885ESR1 2444/4885ESR2 2189/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.