SCHEMBL9684253

SCHEMBL9684253

COc1c(C(C)C)cc(C(C)C)c(OC)c1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.39
GAA P10253 1/20 0.39
GFER P55789 1/20 0.39
ACHE P22303 1/20 0.37
LMNA P02545 2/20 0.33
TRPA1 O75762 1/20 0.32
CHRM1 P11229 1/20 0.32
SLC6A2 P23975 1/20 0.32
ADRA1A P35348 1/20 0.32
HTR2B P41595 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
RARG P13631 1/20 0.31
RXRA P19793 1/20 0.31
PPARG P37231 1/20 0.31
CYP3A4 P08684 2/20 0.31
MAPT P10636 1/20 0.31
CA9 Q16790 1/20 0.31
AKR1B1 P15121 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11775737 0.80 ACHE (0.48) POLBGAAGFERACHELMNA
SCHEMBL13993209 0.78 ALDH1A1 (0.38) POLBGAAGFERLMNAADRA1A
SCHEMBL14640958 0.75 GABRA1 (0.46) POLBGAAGFERRARGRXRA
SCHEMBL19120941 0.75 GAA (0.36) POLBGAAGFERLMNATRPA1
SCHEMBL26261086 0.74 POLB (0.49) POLBGAAGFERACHELMNA
SCHEMBL13706379 0.74 CA1 (0.39) POLBGAAGFERACHELMNA
SCHEMBL3640929 0.73 GABRA1 (0.54) POLBGAAGFERCA2
SCHEMBL3817955 0.73 GAA (0.42) POLBGAAGFERTDP1CYP3A4
SCHEMBL27959753 0.73 POLB (0.34) POLBGAAGFERACHETDP1
SCHEMBL24371396 0.73 GAA (0.43) POLBGAAGFERACHELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5122442-A Water soluble binder; photosensitive compound HOECHST CELANESE CORPORATION (US) 1992-06-16 US disclosed
EP-0212482-B1 PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1989-04-19 EP disclosed
EP-0212482-A2 Process for obtaining negative images from positive photoresists HOECHST CELANESE CORPORATION (US) 1987-03-04 EP disclosed
US-4436804-A Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith AMERICAN HOECHST CORPORATION (US) 1984-03-13 US disclosed