SCHEMBL9686142

SCHEMBL9686142

O=C(O)c1c(S)cccc1-c1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 4/20 0.57
HNF4A P41235 1/20 0.48
KMT2A Q03164 2/20 0.47
HDAC8 Q9BY41 2/20 0.47
MAPT P10636 2/20 0.47
FGFR1 P11362 1/20 0.43
FGFR2 P21802 1/20 0.43
FGFR4 P22455 1/20 0.43
FGFR3 P22607 1/20 0.43
BCAT2 O15382 1/20 0.42
FABP3 P05413 1/20 0.41
FABP4 P15090 1/20 0.41
FABP5 Q01469 1/20 0.41
ALDH1A1 P00352 3/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL593127 0.85 FOLH1 (0.61) FOLH1HNF4AKMT2AHDAC8FGFR1
SCHEMBL28981704 0.82 MAPT (0.61) FOLH1HNF4AKMT2AHDAC8MAPT
SCHEMBL23601109 0.80 MAPT (0.54) FOLH1KMT2AHDAC8MAPTALDH1A1
SCHEMBL23521242 0.78 FOLH1 (0.53) FOLH1HNF4AKMT2AHDAC8BCAT2
SCHEMBL36146 0.78 HNF4A (0.66) FOLH1HNF4AKMT2AMAPTBCAT2
SCHEMBL29376910 0.78 HNF4A (0.66) FOLH1HNF4AKMT2AMAPTBCAT2
SCHEMBL3264678 0.78 CA12 (0.64) FOLH1HNF4AKMT2AHDAC8BCAT2
SCHEMBL9567445 0.77 KMT2A (0.41) FOLH1HNF4AKMT2AFGFR1FGFR2
SCHEMBL9681966 0.77 ALDH1A1 (0.52) KMT2AMAPTALDH1A1CA12CA1
SCHEMBL23911685 0.76 FOLH1 (0.52) FOLH1HNF4AKMT2ABCAT2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4826888-A STORAGE STABLE, DISCOLORATION INHIBITION MITSUBISHI RAYON CO., LTD. (JP) 1989-05-02 US claimed
CN-110431696-B Binder composition for secondary battery 日本电气株式会社 2022-12-06 CN disclosed
US-11404694-B2 Resin composition NEC CORPORATION (JP) 2022-08-02 US disclosed
US-11233231-B2 Electrode with heat-resistant insulating layer NEC CORPORATION (JP) 2022-01-25 US disclosed
US-11018342-B2 Binder composition for secondary battery NEC CORPORATION (JP) 2021-05-25 US disclosed
US-11018341-B2 Binder composition for secondary battery NEC CORPORATION (JP) 2021-05-25 US disclosed
US-20200035996-A1 ELECTRODE WITH HEAT-RESISTANT INSULATING LAYER NEC CORPORATION (JP) 2020-01-30 US disclosed
US-20180248192-A1 RESIN COMPOSITION NEC CORPORATION (JP) 2018-08-30 US disclosed
US-5100458-A Pyrimidine substituted, plant growth regulators BASF AKTIENGESELLSCHAFT (DE) 1992-03-31 US disclosed
US-5047442-A Photopolymerizable composition based on a vinyl compound, a sulfur-containing compound and an alpha-diketone MITSUBISHI RAYON COMPANY LIMITED (JP) 1991-09-10 US disclosed
EP-0201903-B1 PHOTOPOLYMERIZABLE COMPOSITION MITSUBISHI RAYON CO., LTD. (JP) 1991-08-07 EP disclosed
EP-0435104-A2 Salicylic acid derivatives, process for their preparation and their use as herbicide and bioregulators BASF Aktiengesellschaft (DE) 1991-07-03 EP disclosed
US-4826888-A STORAGE STABLE, DISCOLORATION INHIBITION MITSUBISHI RAYON CO., LTD. (JP) 1989-05-02 US disclosed
US-4777190-A Photopolymerizable composition based on a vinyl compound, a sulfur-containing compound and an α-diketone MITSUBISHI RAYON COMPANY LIMITED (JP) 1988-10-11 US disclosed
EP-0201903-A2 Photopolymerizable composition MITSUBISHI RAYON CO., LTD. (JP) 1986-11-20 EP disclosed