SCHEMBL970836

SCHEMBL970836

N#[N+]c1ccc(O)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL740461 0.97 CA3 (0.47)
Hydrochloric Acid SCHEMBL10878287 0.94 CA3 (0.44)
Hydrochloric Acid SCHEMBL11113931 0.94 CA3 (0.44)
Hydrochloric Acid SCHEMBL10981257 0.94 CA3 (0.44)
Hydrochloric Acid SCHEMBL11113929 0.94 CA3 (0.44)
Hydrochloric Acid SCHEMBL10984148 0.92 CA3 (0.42)
SCHEMBL694368 0.89 CA3 (0.40)
Sulfuric Acid SCHEMBL11345321 0.87 LMNA (0.46)
Sulfuric Acid SCHEMBL11345318 0.85 LMNA (0.44)
Hydrochloric Acid SCHEMBL10895645 0.83 DNM1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113024408-A Azobenzene compound, plate-glue integrated adhesive for silicon wafer cutting and application 中国科学技术大学 2021-06-25 CN claimed
CN-111087305-A β -fluoroalkyl cinnamate compound and preparation method thereof 南京工业大学 2020-05-01 CN claimed
CN-107121461-B Integrated capacitive humidity sensor 恩智浦美国有限公司 2021-09-24 CN disclosed
CN-113024408-A Azobenzene compound, plate-glue integrated adhesive for silicon wafer cutting and application 中国科学技术大学 2021-06-25 CN disclosed
US-20200264529-A1 ELECTROSTATIC IMAGE DEVELOPING TONER AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2020-08-20 US disclosed
US-20200264527-A1 ELECTROSTATIC IMAGE DEVELOPING TONER AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2020-08-20 US disclosed
US-20200073268-A1 IMAGE FORMING METHOD AND PRINTED IMAGE Konica Minolta, Inc. (JP) 2020-03-05 US disclosed
US-20180217518-A1 TONER AND IMAGE FORMATION METHOD Konica Minolta, Inc. (JP) 2018-08-02 US disclosed
CN-107121461-A Integrated capacitive humidity sensor 恩智浦美国有限公司 2017-09-01 CN disclosed
US-9487611-B2 Particles for electrophoretic displays MERCK PATENT GMBH (DE) 2016-11-08 US disclosed
US-9126899-B2 Photosensitive azobenzene derivative NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2015-09-08 US disclosed
US-20110011773-A1 Separation of Nanostructures MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2011-01-20 US disclosed
CN-101910049-A Separation of nanostructures MASSACHUSETTS INST TECHNOLOGY 2010-12-08 CN disclosed
EP-2225174-A2 SEPARATION OF NANOSTRUCTURES Massachusetts Institute of Technology (US) 2010-09-08 EP disclosed
WO-2009070240-A2 SEPARATION OF NANOSTRUCTURES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2009-06-04 WO disclosed
US-20090088582-A1 CROSSLINKED CARBON NANOTUBE FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20080275224-A1 Cyanoborate, Fluoroalkylphosphate, Fluoroalkylborate or Imide Dyes MERCK PATENT GMBH (DE) 2008-11-06 US disclosed
EP-0596684-B1 Preparation of substituted aryl compounds GREAT LAKES FINE CHEM LTD (GB) 1997-01-29 EP disclosed
US-5416235-A Preparation of substituted aryl compounds OCTEL CHEMICALS LIMITED (GB) 1995-05-16 US disclosed
EP-0596684-A1 Preparation of substituted aryl compounds GREAT LAKES FINE CHEMICALS LIMITED (GB) 1994-05-11 EP disclosed