SCHEMBL970836

SCHEMBL970836

N#[N+]c1ccc(O)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL740461 0.97 CA3 (0.47) —
Hydrochloric Acid SCHEMBL11113931 0.94 CA3 (0.44) —
Hydrochloric Acid SCHEMBL10981257 0.94 CA3 (0.44) —
Hydrochloric Acid SCHEMBL11113929 0.94 CA3 (0.44) —
Hydrochloric Acid SCHEMBL10878287 0.94 CA3 (0.44) —
Hydrochloric Acid SCHEMBL10984148 0.92 CA3 (0.42) —
SCHEMBL694368 0.89 CA3 (0.40) —
Sulfuric Acid SCHEMBL11345321 0.87 LMNA (0.46) —
Sulfuric Acid SCHEMBL11345318 0.85 LMNA (0.44) —
Hydrochloric Acid SCHEMBL10895645 0.83 DNM1 (0.41) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113024408-A Azobenzene compound, plate-glue integrated adhesive for silicon wafer cutting and application 中国科学技术大学 2021-06-25 — — CN claimed
CN-111087305-A β -fluoroalkyl cinnamate compound and preparation method thereof 南京工业大学 2020-05-01 — — CN claimed
CN-107121461-B Integrated capacitive humidity sensor 恩智浦美国有限公司 2021-09-24 — — CN disclosed
CN-113024408-A Azobenzene compound, plate-glue integrated adhesive for silicon wafer cutting and application 中国科学技术大学 2021-06-25 — — CN disclosed
US-20200264529-A1 ELECTROSTATIC IMAGE DEVELOPING TONER AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2020-08-20 — — US disclosed
US-20200264527-A1 ELECTROSTATIC IMAGE DEVELOPING TONER AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2020-08-20 — — US disclosed
US-20200073268-A1 IMAGE FORMING METHOD AND PRINTED IMAGE Konica Minolta, Inc. (JP) 2020-03-05 — — US disclosed
US-20180217518-A1 TONER AND IMAGE FORMATION METHOD Konica Minolta, Inc. (JP) 2018-08-02 — — US disclosed
CN-107121461-A Integrated capacitive humidity sensor 恩智浦美国有限公司 2017-09-01 — — CN disclosed
US-9487611-B2 Particles for electrophoretic displays MERCK PATENT GMBH (DE) 2016-11-08 — — US disclosed
US-9126899-B2 Photosensitive azobenzene derivative NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2015-09-08 — — US disclosed
US-20110011773-A1 Separation of Nanostructures MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2011-01-20 — — US disclosed
CN-101910049-A Separation of nanostructures MASSACHUSETTS INST TECHNOLOGY 2010-12-08 — — CN disclosed
EP-2225174-A2 SEPARATION OF NANOSTRUCTURES Massachusetts Institute of Technology (US) 2010-09-08 — — EP disclosed
WO-2009070240-A2 SEPARATION OF NANOSTRUCTURES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2009-06-04 — — WO disclosed
US-20090088582-A1 CROSSLINKED CARBON NANOTUBE FUJIFILM CORPORATION (JP) 2009-04-02 — — US disclosed
US-20080275224-A1 Cyanoborate, Fluoroalkylphosphate, Fluoroalkylborate or Imide Dyes MERCK PATENT GMBH (DE) 2008-11-06 — — US disclosed
EP-0596684-B1 Preparation of substituted aryl compounds GREAT LAKES FINE CHEM LTD (GB) 1997-01-29 — — EP disclosed
US-5416235-A Preparation of substituted aryl compounds OCTEL CHEMICALS LIMITED (GB) 1995-05-16 — — US disclosed
EP-0596684-A1 Preparation of substituted aryl compounds GREAT LAKES FINE CHEMICALS LIMITED (GB) 1994-05-11 — — EP disclosed
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