Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | ABAT | P80404 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CPB1 | P15086 | 1/20 | 0.32 |
| ▸ | ACLY | P53396 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2121629 | 0.75 | GRIK1 (0.40) | ABATKDM4ETSHR | |
| SCHEMBL7248010 | 0.75 | GRIK1 (0.40) | ABATKDM4ETSHR | |
| SCHEMBL6709352 | 0.73 | KDM4E (0.50) | ABATKDM4ETSHR | |
| SCHEMBL845019 | 0.73 | ABAT (0.32) | ABATKDM4ETSHR | |
| SCHEMBL845018 | 0.73 | ABAT (0.32) | ABATKDM4ETSHR | |
| SCHEMBL4887355 | 0.72 | TSHR (0.54) | ALDH1A1CYP2D6ALOX15ABATKDM4E | |
| SCHEMBL19407227 | 0.72 | TSHR (0.54) | ALDH1A1CYP2D6ALOX15ABATKDM4E | |
| SCHEMBL13541377 | 0.72 | TSHR (0.54) | ALDH1A1CYP2D6ALOX15ABATKDM4E | |
| SCHEMBL11842601 | 0.70 | FFAR3 (0.43) | ALDH1A1CYP2D6ALOX15ABATKDM4E | |
| SCHEMBL542016 | 0.70 | LMNA (0.45) | ALDH1A1CYP2D6ALOX15ABATKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0242080-B1 | COPOLYMER COMPOSITIONS | PARAGON OPTICAL INC (US) | 1992-12-16 | — | — | EP | claimed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | disclosed |