SCHEMBL9719608

SCHEMBL9719608

CC(C)=C(OC(=C(C)C)c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 5/20 0.42
CES1 P23141 5/20 0.42
TSHR P16473 2/20 0.41
LMNA P02545 2/20 0.40
MAPK1 P28482 2/20 0.40
HTT P42858 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ATM Q13315 1/20 0.39
ELANE P08246 1/20 0.39
F2 P00734 1/20 0.39
ALDH1A1 P00352 3/20 0.38
DAO P14920 1/20 0.38
NAPRT Q6XQN6 1/20 0.38
ESR1 P03372 1/20 0.37
PRSS1 P07477 2/20 0.36
CTSG P08311 2/20 0.36
CTRB1 P17538 2/20 0.36
CMA1 P23946 2/20 0.36
MAPT P10636 2/20 0.36
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9311224 0.84 TSHR (0.52) CES2CES1TSHRLMNAMAPK1
SCHEMBL9310344 0.83 ELANE (0.48) CES2CES1MAPK1L3MBTL1ELANE
SCHEMBL10478974 0.83 CES2 (0.43) CES2CES1TSHRLMNAMAPK1
SCHEMBL28903754 0.80 CES2 (0.39) CES2CES1TSHRLMNAMAPK1
SCHEMBL11807023 0.77 TSHR (0.47) TSHRLMNAMAPK1HTTL3MBTL1
SCHEMBL28877100 0.76 F2 (0.40) CES2CES1TSHRLMNAL3MBTL1
SCHEMBL1603613 0.75 CES1 (0.50) CES2CES1TSHRLMNAL3MBTL1
SCHEMBL9255093 0.74 F2 (0.39) CES2CES1TSHRLMNAMAPK1
SCHEMBL4019330 0.72 TSHR (0.56) CES2CES1TSHRLMNAMAPK1
SCHEMBL1603720 0.72 TSHR (0.56) CES2CES1TSHRLMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5166405-A Polymers suitable for use as positive photoresists CIBA-GEIGY CORPORATION (US) 1992-11-24 US disclosed
US-5106932-A Polymers usable as positive photoresists CIBA-GEIGY CORPORATION (US) 1992-04-21 US disclosed