SCHEMBL9722928

SCHEMBL9722928

CCc1cc(C2CCCCC2)cc(CC)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.47
ACMSD Q8TDX5 2/20 0.41
NOS3 P29474 2/20 0.40
NOS1 P29475 2/20 0.40
NOS2 P35228 2/20 0.40
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
GABRA1 P14867 1/20 0.39
GABRB2 P47870 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
KMO O15229 1/20 0.39
CNR2 P34972 6/20 0.38
CNR1 P21554 5/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
MAPT P10636 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10947771 0.90 GABRA1 (0.43) EPHX2GABRA1GABRB2CYP1A2CYP3A4
SCHEMBL8154668 0.83 ESR2 (0.38) EPHX2ACMSDCYP3A4CYP2C9
SCHEMBL2219914 0.82 ACMSD (0.39) EPHX2ACMSDNOS3NOS1NOS2
SCHEMBL9861573 0.82 POLQ (0.38) EPHX2ACMSDHDAC4HDAC2HDAC8
SCHEMBL11422572 0.81 EPHX2 (0.47) EPHX2ACMSDNOS3NOS1NOS2
SCHEMBL11161163 0.80 ACMSD (0.57) EPHX2ACMSDNOS3NOS1NOS2
SCHEMBL16850510 0.80 ALDH1A1 (0.41) EPHX2ACMSDNOS3NOS1NOS2
SCHEMBL3817408 0.80 ESR2 (0.55) CYP3A4CYP2C9
SCHEMBL4452694 0.80 HDAC4 (0.38) EPHX2ACMSDNOS3NOS1NOS2
SCHEMBL17029862 0.78 EPHX2 (0.42) EPHX2ACMSDNOS3NOS1NOS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
EP-0468162-A1 Modified polyphenylene ether based thermoplastic moulding compositions HÜLS AKTIENGESELLSCHAFT (DE) 1992-01-29 EP disclosed