Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9743711 | 0.96 | NPSR1 (0.46) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| SCHEMBL124582 | 0.96 | NPSR1 (0.46) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| Hydrochloric Acid SCHEMBL9194071 | 0.93 | NPSR1 (0.44) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| Sulfuric Acid SCHEMBL9324944 | 0.88 | HSP90AA1 (0.43) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| Benzene SCHEMBL28328871 | 0.83 | TSHR (0.43) | ALDH1A1TSHRGLAL3MBTL1SMN1; SMN2 | |
| SCHEMBL28550181 | 0.83 | ALDH1A1 (0.42) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| SCHEMBL9874763 | 0.81 | TSHR (0.55) | ALDH1A1KMT2ATSHRPOLBL3MBTL1 | |
| SCHEMBL28315420 | 0.80 | NPSR1 (0.44) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| SCHEMBL29602588 | 0.78 | ALDH1A1 (0.45) | NPSR1TDP1ALDH1A1KMT2ATSHR | |
| SCHEMBL11144520 | 0.78 | NPSR1 (0.43) | NPSR1TDP1ALDH1A1KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1011131-B1 | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | INFINEON TECHNOLOGIES AG (DE) | 2007-07-25 | — | — | EP | claimed |
| US-6136714-A | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-10-24 | — | — | US | claimed |
| EP-1011131-A1 | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-06-21 | — | — | EP | claimed |
| US-20160028177-A1 | ELECTRIC CONNECTION STRUCTURE AND TERMINAL | AUTONETWORKS TECHNOLOGIES, LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| EP-2333135-A1 | RUST INHIBITOR AND SURFACE-TREATED METAL MATERIAL | AutoNetworks Technologies, Ltd. (JP) | 2011-06-15 | — | — | EP | disclosed |
| US-20110008634-A1 | RUST INHIBITOR AND SURFACE TREATMENT METAL MATERIAL | AUTONETWORKS TECHNOLOGIES, LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| EP-1011131-B1 | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | INFINEON TECHNOLOGIES AG (DE) | 2007-07-25 | — | — | EP | disclosed |
| EP-1149052-A1 | PROCESS FOR REMOVING ORGANIC AND INORGANIC CONTAMINANTS FROM PHENOLIC STRIPPED SOUR WATER EMPLOYING REVERSE OSMOSIS | TEXACO DEVELOPMENT CORPORATION (US) | 2001-10-31 | — | — | EP | disclosed |
| US-6136714-A | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-10-24 | — | — | US | disclosed |
| WO-2000041972-A1 | PROCESS FOR REMOVING ORGANIC AND INORGANIC CONTAMINANTS FROM PHENOLIC STRIPPED SOUR WATER EMPLOYING REVERSE OSMOSIS | TEXACO DEVELOPMENT CORPORATION (US) | 2000-07-20 | — | — | WO | disclosed |
| EP-1011131-A1 | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-06-21 | — | — | EP | disclosed |
| US-6071413-A | INCLUDING SELENIUM AND DIVALENT AND TRIVALENT METAL CATIONS TO REDUCE THE CONCENTRATION OF SELENIUM | TEXACO INC. (US) | 2000-06-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110008634-A1 | RUST INHIBITOR AND SURFACE TREATMENT METAL MATERIAL | CLTC, CLTA, BCAT1 | NPSR1 4790/4885TDP1 4720/4885ALDH1A1 1575/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.