Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | GFER | P55789 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | PANK3 | Q9H999 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27957835 | 0.89 | ALDH1A1 (0.31) | ALDH1A1PANK3 | |
| SCHEMBL97345 | 0.88 | CNR2 (0.32) | CNR2 | |
| SCHEMBL14040417 | 0.88 | CNR2 (0.32) | CNR2 | |
| SCHEMBL14491221 | 0.88 | CNR2 (0.32) | CNR2 | |
| SCHEMBL16385622 | 0.88 | CNR2 (0.32) | CNR2 | |
| SCHEMBL4995636 | 0.87 | CNR2 (0.32) | CNR2 | |
| Decane SCHEMBL6385306 | 0.86 | EPHX1 (0.36) | PANK3CNR2 | |
| SCHEMBL23021671 | 0.79 | — | — | |
| SCHEMBL12256432 | 0.79 | CNR2 (0.31) | ALDH1A1CNR2 | |
| SCHEMBL17481824 | 0.76 | CNR2 (0.33) | ALDH1A1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2021-09-21 | — | — | US | disclosed |
| US-11003079-B2 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2021-05-11 | — | — | US | disclosed |
| US-20190264035-A1 | SEMICONDUCTOR SUBSTRATE TREATMENT AGENT AND SUBSTRATE-TREATING METHOD | JSR CORPORATION (JP) | 2019-08-29 | — | — | US | disclosed |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2019-08-08 | — | — | US | disclosed |
| US-20190094695-A1 | COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-7871761-B2 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190094695-A1 | COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | RER1, TOP1, RIF1 | ALDH1A1 1845/4885NPC1 943/4885MAPT 2067/4885 |
| US-11003079-B2 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | RER1, TOP1, RIF1 | ALDH1A1 1845/4885NPC1 943/4885MAPT 2067/4885 |
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | EMG1, FN1, TOP1 | ALDH1A1 849/4885NPC1 1115/4885MAPT 3043/4885 |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | EMG1, FN1, TOP1 | ALDH1A1 849/4885NPC1 1115/4885MAPT 3043/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.