Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.45 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | RIPK1 | Q13546 | 4/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | MGLL | Q99685 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CTSB | P07858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1917938 | 0.79 | GABRA1 (0.46) | GABRA1GABRB2ALDH1A1GAAMGLL | |
| SCHEMBL9746462 | 0.72 | GABRA1 (0.40) | GABRA1GABRB2ALDH1A1GAATSHR | |
| SCHEMBL9747152 | 0.72 | GABRA1 (0.40) | GABRA1GABRB2ALDH1A1GAATSHR | |
| SCHEMBL20637440 | 0.72 | GABRA1 (0.42) | GABRA1GABRB2ALDH1A1GAAMGLL | |
| SCHEMBL4267262 | 0.71 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1GAATSHR | |
| SCHEMBL27870531 | 0.71 | GABRA1 (0.39) | GABRA1GABRB2ALDH1A1GAATSHR | |
| SCHEMBL28853525 | 0.70 | GABRA1 (0.41) | GABRA1GABRB2ALDH1A1GAARIPK1 | |
| SCHEMBL21383367 | 0.70 | GABRA1 (0.41) | GABRA1GABRB2ALDH1A1GAARIPK1 | |
| SCHEMBL115194 | 0.70 | MGLL (0.42) | GABRA1GABRB2ALDH1A1GAAMGLL | |
| SCHEMBL6114728 | 0.70 | GABRA1 (0.46) | GABRA1GABRB2ALDH1A1GAAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114207038-B | Resin composition, method for producing cured product, pattern cured product, interlayer insulating film, covercoat, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-112334833-A | Negative photosensitive resin composition, polyimide using same, and method for producing cured relief pattern | 旭化成株式会社 | 2021-02-05 | — | — | CN | disclosed |
| US-10175577-B2 | Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-01-08 | — | — | US | disclosed |
| US-20150024173-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2015-01-22 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |