⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL819835 | 0.78 | — | — | |
| SCHEMBL1481696 | 0.78 | — | — | |
| SCHEMBL40446 | 0.75 | — | — | |
| SCHEMBL24245479 | 0.75 | — | — | |
| SCHEMBL4199276 | 0.75 | LMNA (0.46) | — | |
| SCHEMBL819506 | 0.74 | — | — | |
| SCHEMBL3806218 | 0.73 | — | — | |
| SCHEMBL976852 | 0.72 | DNM1 (0.44) | — | |
| SCHEMBL5956351 | 0.71 | CA12 (0.48) | — | |
| SCHEMBL5307045 | 0.71 | DNM1 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107828273-A | Nano modified pure water gravure ink and application thereof | 肖锋 | 2018-03-23 | — | — | CN | claimed |
| EP-2067828-B1 | inkjet ink | MIMAKI ENG KK (JP) | 2011-06-15 | — | — | EP | claimed |
| US-11565502-B2 | Bonding method | TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) | 2023-01-31 | — | — | US | disclosed |
| CN-111253867-B | Bonding method | 丰田纺织株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-111251698-B | Laminate and method for producing same | 丰田纺织株式会社 | 2022-03-08 | — | — | CN | disclosed |
| CN-111253867-A | Bonding method | 丰田纺织株式会社 | 2020-06-09 | — | — | CN | disclosed |
| CN-111251698-A | Laminate and method for producing same | 丰田纺织株式会社 | 2020-06-09 | — | — | CN | disclosed |
| US-20200171792-A1 | LAMINATED BODY AND METHOD FOR PRODUCING SAME | TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20200171793-A1 | BONDING METHOD | TOYOTA BOSHOKU KABUSHIKI KAISHA (JP) | 2020-06-04 | — | — | US | disclosed |
| CN-107828273-A | Nano modified pure water gravure ink and application thereof | 肖锋 | 2018-03-23 | — | — | CN | disclosed |
| US-20150296646-A1 | PROTECTIVE PLATE AND DISPLAY DEVICE | SHARP KABUSHIKI KAISHA (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-1155091-A1 | POWDER-SLURRY THAT CAN BE HARDENED BY ACTINIC RADIATION OR OPTIONALLY BY THERMAL MEANS, METHOD FOR PRODUCING SAID SLURRY AND USE OF THE SAME | BASF Coatings AG (DE) | 2001-11-21 | — | — | EP | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1123355-A1 | INTRINSICALLY VISCOUS CLEAR POWDER COATING SLURRY WHICH IS FREE OF ORGANIC SOLVENTS AND EXTERNAL EMULSIFIERS, METHOD FOR PRODUCING SAID SLURRY AND USE OF THE SAME | BASF Coatings AG (DE) | 2001-08-16 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| WO-2000050518-A1 | POWDER-SLURRY THAT CAN BE HARDENED BY ACTINIC RADIATION OR OPTIONALLY BY THERMAL MEANS, METHOD FOR PRODUCING SAID SLURRY AND USE OF THE SAME | BASF COATINGS AG (DE) | 2000-08-31 | — | — | WO | disclosed |
| WO-2000015721-A1 | INTRINSICALLY VISCOUS CLEAR POWDER COATING SLURRY WHICH IS FREE OF ORGANIC SOLVENTS AND EXTERNAL EMULSIFIERS, METHOD FOR PRODUCING SAID SLURRY AND USE OF THE SAME | BASF COATINGS AG (DE) | 2000-03-23 | — | — | WO | disclosed |