Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 1/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.33 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703594 | 0.91 | ADRB2 (0.39) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL976747 | 0.88 | ADRB2 (0.41) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL976556 | 0.86 | — | — | |
| SCHEMBL3614310 | 0.84 | ADRB2 (0.35) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL1595849 | 0.83 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL705364 | 0.83 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL706695 | 0.83 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL17209128 | 0.83 | THRB (0.35) | TSHR | |
| SCHEMBL28805966 | 0.83 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL4084291 | 0.83 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3240822-B1 | TERMINAL-FUNCTIONALIZED POLYMER AND RELATED METHODS | BRIDGESTONE CORP (JP) | 2023-07-26 | — | — | EP | disclosed |
| CN-112625246-B | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2023-01-10 | — | — | CN | disclosed |
| US-11111338-B2 | Terminal-functionalized polymer and related methods | BRIDGESTONE CORPORATION (JP) | 2021-09-07 | — | — | US | disclosed |
| CN-112625246-A | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2021-04-09 | — | — | CN | disclosed |
| CN-107428940-B | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2020-12-15 | — | — | CN | disclosed |
| US-20200109242-A1 | Terminal-Functionalized Polymer And Related Methods | BRIDGESTONE CORPORATION (JP) | 2020-04-09 | — | — | US | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180002490-A1 | Terminal-Functionalized Polymer And Related Methods | BRIDGESTONE CORPORATION (JP) | 2018-01-04 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |