SCHEMBL9769197

SCHEMBL9769197

C=C(C)c1cccc(O[Si](C)(C)C)c1.C=C(Cl)C(=O)OC

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
KCNQ3 O43525 1/20 0.38
KCNQ2 O43526 1/20 0.38
ALDH1A1 P00352 3/20 0.37
TSHR P16473 2/20 0.37
NPSR1 Q6W5P4 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PARP1 P09874 1/20 0.37
NPC1 O15118 3/20 0.37
RAB9A P51151 3/20 0.37
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
LMNA P02545 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
TAS1R3 Q7RTX0 1/20 0.35
TAS1R1 Q7RTX1 1/20 0.35
MTNR1A P48039 1/20 0.35
MTNR1B P49286 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31187414 0.84 NPC1 (0.41) CES2CES1ALDH1A1TSHRNPSR1
SCHEMBL9507645 0.84 NPC1 (0.41) CES2CES1ALDH1A1TSHRNPSR1
SCHEMBL9395136 0.77 TSHR (0.47) CES2CES1ALDH1A1TSHRNPSR1
SCHEMBL7912420 0.77 CES2 (0.46) CES2CES1KCNQ3KCNQ2ALDH1A1
SCHEMBL16554270 0.70 CA12 (0.40) CES2CES1ALDH1A1TSHRL3MBTL1
SCHEMBL29173007 0.70 ELANE (0.46) ALDH1A1MEN1KMT2ALMNA
SCHEMBL1790008 0.69 NPC1 (0.63) CES2CES1ALDH1A1TSHRNPSR1
SCHEMBL30854918 0.69 NPC1 (0.63) CES2CES1ALDH1A1TSHRNPSR1
SCHEMBL7642460 0.69 LMNA (0.59) CES2CES1ALDH1A1PARP1NPC1
SCHEMBL4186126 0.67 TSHR (0.55) ALDH1A1TSHRNPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5068169-A PROCESS FOR PRODUCTION OF SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 1991-11-26 US disclosed
EP-0366460-A2 Process for production of semiconductor device FUJITSU LIMITED (JP) 1990-05-02 EP disclosed