SCHEMBL9813346

SCHEMBL9813346

O=S(=O)(O)c1ccc(NNc2ccc(S(=O)(=O)O)cc2S(=O)(=O)O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TIMP3 P35625 3/20 0.51
RAPGEF4 Q8WZA2 1/20 0.45
SNCA P37840 2/20 0.41
ALDH1A1 P00352 5/20 0.41
CASP6 P55212 4/20 0.41
KDM4E B2RXH2 2/20 0.41
POLB P06746 2/20 0.41
GAA P10253 2/20 0.41
MAPT P10636 2/20 0.41
RECQL P46063 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ELAVL1 Q15717 1/20 0.41
NT5E P21589 3/20 0.40
NSD2 O96028 1/20 0.40
APEX1 P27695 1/20 0.40
APOBEC3A P31941 1/20 0.40
APOBEC3G Q9HC16 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9902951 0.86 SNCA (0.41) TIMP3RAPGEF4SNCAALDH1A1CASP6
SCHEMBL9680192 0.82 TIMP3 (0.50) TIMP3RAPGEF4SNCAALDH1A1CASP6
SCHEMBL8848749 0.81 LMNA (0.56) TIMP3SNCAALDH1A1KDM4EPOLB
SCHEMBL9637465 0.78 TIMP3 (0.44) TIMP3ALDH1A1KDM4EPOLBGAA
SCHEMBL14819035 0.77 LMNA (0.50) TIMP3SNCAALDH1A1KDM4EPOLB
SCHEMBL8981247 0.77 TIMP3 (0.51) TIMP3RAPGEF4SNCAALDH1A1CASP6
SCHEMBL25049824 0.75 PRMT1 (0.49) TIMP3ALDH1A1MAPTMEN1KMT2A
SCHEMBL19982688 0.75 CTDSP1 (0.49) TIMP3RAPGEF4SNCAALDH1A1CASP6
SCHEMBL9636039 0.74 CASR (0.49) ALDH1A1POLBMAPTL3MBTL1MEN1
SCHEMBL12177955 0.74 HSD17B10 (0.43) RAPGEF4SNCAALDH1A1CASP6TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0114341-B1 DYE-CONTAINING LAYER IN A PHOTOPOLYMERISABLE COMPOSITION, AND PROCESS FOR OBTAINING RELIEF AND PRINTING FORMES BASF Aktiengesellschaft (DE) 1991-07-24 EP disclosed