Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRA | P10827 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.39 |
| ▸ | MGLL | Q99685 | 1/20 | 0.39 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.39 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.38 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.38 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.38 |
| ▸ | S1PR5 | Q9H228 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.37 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.37 |
| ▸ | HTR2B | P41595 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31108773 | 1.00 | THRA (0.41) | THRATHRBFAAHMGLLPLA2G2A | |
| Hydrochloric Acid SCHEMBL31108776 | 0.99 | THRA (0.40) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL14015796 | 0.76 | S1PR5 (0.46) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL98171 | 0.76 | KDM4E (0.43) | MAPTALDH1A1KDM4EL3MBTL1 | |
| SCHEMBL30434547 | 0.74 | FAAH (0.45) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL30434175 | 0.74 | FAAH (0.45) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL30504036 | 0.74 | FAAH (0.45) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL23271786 | 0.74 | S1PR5 (0.47) | THRATHRBFAAHMGLLS1PR5 | |
| SCHEMBL19612523 | 0.74 | TLR8 (0.43) | THRATHRBFAAHMGLLPLA2G2A | |
| SCHEMBL19612246 | 0.74 | S1PR5 (0.47) | THRATHRBFAAHMGLLS1PR5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170285469-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170285469-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9766541-B2 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9766541-B2 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9740105-B2 | Resist pattern formation method and resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9740105-B2 | Resist pattern formation method and resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20120148955-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120100487-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120058430-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-8124313-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110287362-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-11-24 | — | — | US | disclosed |
| US-20100273105-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100121077-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-7682772-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-23 | — | — | US | disclosed |
| US-20090130597-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100273105-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR | RER1, GLRA1, GRIN1 | THRA 1070/4885THRB 1516/4885FAAH 1256/4885 |
| US-20100121077-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ABCC1, SLC11A2 | THRA 2906/4885THRB 3505/4885FAAH 2438/4885 |
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, ABCC1 | THRA 1307/4885THRB 2018/4885FAAH 803/4885 |
| US-20110287362-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, SCO2 | THRA 1167/4885THRB 1373/4885FAAH 2351/4885 |
| US-20120058430-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | ASIC1, SLC11A2, RER1 | THRA 2363/4885THRB 2756/4885FAAH 1521/4885 |
| US-20120148955-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND | C1R, SLC11A2, RER1 | THRA 1967/4885THRB 2253/4885FAAH 1432/4885 |
| US-20090130597-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, ABCC1 | THRA 2774/4885THRB 3468/4885FAAH 2554/4885 |
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | SLC11A2, DRD1, ZYX | THRA 2476/4885THRB 3327/4885FAAH 2658/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.