SCHEMBL9861519

SCHEMBL9861519

CC(C)N(c1nc(Br)nc(Br)n1)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32679727 0.80 LMNA (0.39)
SCHEMBL10722443 0.68 ALDH1A1 (0.42)
SCHEMBL8465466 0.68
SCHEMBL10863391 0.68 GAA (0.32)
SCHEMBL8057256 0.64 ALDH1A1 (0.61)
SCHEMBL2844727 0.61 HDAC8 (0.32)
SCHEMBL3262195 0.61 PDE4A (0.41)
SCHEMBL10573107 0.58 HSP90AA1 (0.33)
SCHEMBL5459662 0.57 LMNA (0.35)
SCHEMBL275457 0.57 LMNA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4981964-A PHOTOSTABILIZERS ICI AMERICAS INC. (US) 1991-01-01 US disclosed
EP-0373892-A1 Tetramethyl piperidyl terminated triazine oligomeric esters and amides ICI AMERICAS INC. (US) 1990-06-20 EP disclosed
EP-0373839-A1 Oligomeric polyesters and polyamides containing dipiperidyl triazine groups ICI AMERICAS INC. (US) 1990-06-20 EP disclosed
US-4889882-A RADIATION RESISTANCE, PHOTOSTABILITY POLYMER ADDITIVE ICI AMERICAS INC. (US) 1989-12-26 US disclosed